Preparation method of inorganic semiconductor cadmium selenide nanotube structure
A technology of inorganic semiconductor and cadmium selenide is applied in the field of inorganic semiconductor cadmium selenide nanotube structure and preparation thereof, and achieves the effects of simple experimental equipment, simple and easy experimental operation, and uniform morphology.
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Embodiment 1
[0034] Place perylene powder, cadmium selenide powder and silicon chip in the quartz tube of the tube furnace in sequence according to the flow direction of the air flow, wherein the silicon chip is fixed on the upper side of the inner wall with high temperature resistant glue, and the air flow is nitrogen to be sent into the quartz tube; Nitrogen gas is passed into the quartz tube at a flow rate of 120 ml / min. When the quartz tube is completely in an inert gas atmosphere, while maintaining the inert gas flow, control the temperature of the tube furnace from 30 ° C to 900 ° C within 30 minutes and The temperature is maintained at this temperature for 40 minutes to fully proceed with the preparation of the nanotube structure. After completion, the temperature is naturally cooled to obtain an inorganic semiconductor cadmium selenide nanotube structure on the basal surface of the silicon wafer. The distance between the perylene powder and the mouth of the tube furnace is 1 cm, the...
Embodiment 2
[0042] Place perylene powder and cadmium selenide powder successively on the inner wall of the quartz tube of the tube furnace according to the flow direction of the air flow and fix the silicon chip on the upper side of the inner wall, and the air flow is nitrogen to be sent into the quartz tube; Flow rate of 140 ml / min into nitrogen, when the quartz tube is completely in an inert gas atmosphere, while maintaining the inert gas flow, control the temperature of the tube furnace from 30°C to 880°C within 40 minutes and keep the temperature at this temperature 30 minutes to make the preparation of the nanotube structure fully proceed, and then naturally cool down to obtain the inorganic semiconductor cadmium selenide nanotube structure on the basal surface of the silicon wafer. The distance between the perylene powder and the mouth of the tube furnace is 2 cm, the cadmium selenide powder is placed in the middle of the inner wall of the quartz tube, and the silicon wafer is 21 cm ...
Embodiment 3
[0050] Place perylene powder and cadmium selenide powder successively on the inner wall of the quartz tube of the tube furnace according to the flow direction of the air flow and fix the silicon chip on the upper side of the inner wall, and the air flow is nitrogen to be sent into the quartz tube; The flow rate of 100 ml / min is fed with nitrogen gas. When the quartz tube is completely in an inert gas atmosphere, while maintaining the inert gas flow, control the temperature of the tube furnace from 30 ° C to 930 ° C within 50 minutes and keep the temperature at this temperature 60 minutes to make the preparation of the nanotube structure fully proceed, and then naturally cool down to obtain the inorganic semiconductor cadmium selenide nanotube structure on the basal surface of the silicon wafer. The distance between the perylene powder and the mouth of the tube furnace is 1.5 cm, the cadmium selenide powder is placed in the middle of the inner wall of the quartz tube, and the si...
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