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Cover for a substrate table, substrate table for a lithographic apparatus, lithographic apparatus, and device manufacturing method

A technology of lithography equipment and substrate table, which is applied in the field of lithography equipment and device manufacturing, and can solve problems such as undesired

Inactive Publication Date: 2011-09-21
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This may require additional or more powerful electric motors, and turbulence in the liquid may cause undesirable or unintended effects

Method used

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  • Cover for a substrate table, substrate table for a lithographic apparatus, lithographic apparatus, and device manufacturing method
  • Cover for a substrate table, substrate table for a lithographic apparatus, lithographic apparatus, and device manufacturing method
  • Cover for a substrate table, substrate table for a lithographic apparatus, lithographic apparatus, and device manufacturing method

Examples

Experimental program
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Embodiment Construction

[0054] figure 1 A lithographic apparatus according to an embodiment of the invention is schematically shown. The lithography equipment includes:

[0055] - an illumination system (illuminator) IL configured to condition a radiation beam B (eg, ultraviolet (UV) radiation or deep ultraviolet (DUV) radiation);

[0056] - a support structure (eg mask table) MT configured to support the patterning device (eg mask) MA and connected to first positioning means PM configured to precisely position the patterning device MA according to determined parameters;

[0057] - a substrate table (e.g. a wafer table) WT configured to hold a substrate (e.g. a resist-coated wafer) W and configured for a second positioning of the substrate W precisely according to determined parameters device PW connected; and

[0058] - A projection system (eg a refractive projection lens system) PS configured to project the pattern imparted to the radiation beam B by the patterning device MA onto a target portio...

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Abstract

The present invention relates to a cover for a substrate table, a substrate table for a lithographic apparatus, a lithographic apparatus and a device manufacturing method. Especially, a cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.

Description

technical field [0001] The present invention relates to a cover for a substrate table, a substrate table for a lithography apparatus, a lithography apparatus and a device manufacturing method. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or more dies) on a substrate (eg, a silicon wafer). Typically, the pattern is transferred by imaging the pattern onto a layer of radiation sensitive material (resist) provided on the substrate. Typically, a single substrate will contain a network of adjacent target portions tha...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70341G03F7/20G03F7/70716H01L21/683H01L21/027G03F7/2041H01L21/0274
Inventor R·W·L·拉法瑞N·J·J·罗塞特A·N·兹德瑞乌卡夫J·W·斯塔伍德埃姆B·L·J·比哲
Owner ASML NETHERLANDS BV