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Actuator system, lithographic apparatus, method of controlling the position of a component and device manufacturing method

A technology for actuators and controllers, applied in the field of manufacturing devices, can solve problems such as increased costs and expensive piezoelectric actuators

Inactive Publication Date: 2014-07-09
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, known piezoelectric actuators can be relatively expensive
In addition, known piezoelectric actuator systems typically require relatively complex control systems and many connecting wires to control them, both of which further increase costs, especially in relation to their use in vacuum chambers

Method used

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  • Actuator system, lithographic apparatus, method of controlling the position of a component and device manufacturing method
  • Actuator system, lithographic apparatus, method of controlling the position of a component and device manufacturing method
  • Actuator system, lithographic apparatus, method of controlling the position of a component and device manufacturing method

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Embodiment Construction

[0028] Described embodiments and references in the specification to "one embodiment," "an embodiment," "exemplary embodiment," etc. mean that the described embodiments may include particular features, structures, or characteristics, but that each implementation Examples may not necessarily include specific features, structures or characteristics. Moreover, these terms are not necessarily referring to the same embodiment. In addition, when specific features, structures or characteristics are described in combination with an embodiment, it should be understood that those features, structures or characteristics can be combined with other embodiments according to the knowledge of those skilled in the art, whether explicitly described or not.

[0029] figure 1 A lithographic apparatus according to an embodiment of the present invention is schematically shown. The equipment includes:

[0030] - an illumination system (illuminator) IL configured to condition a radiation beam B (eg...

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PUM

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Abstract

An actuator system configured to move a component relative to a base of the actuator system is provided. The actuator system comprises a first and a second actuation element, each comprising two material parts connected to each other and having different coefficients of thermal expansion. The two actuation elements are configured such that, if the temperature of one actuation element is increased, it applies a force to the on the part. The actuator system also includes at least one power supply configured to independently controllably heat the first and second actuation elements.

Description

technical field [0001] Embodiments of the invention relate to an actuator system, a lithographic apparatus, a method of controlling the position of a component, and a method of manufacturing a device. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually to a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or more dies) on a substrate (eg, a silicon wafer). Typically, the pattern is transferred via imaging to a layer of radiation sensitive material (resist) provided on the substrate. Typically, a single substrate will contain a network of successively patterned adjacen...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20F03G7/06
CPCG03F7/70141G03F7/70825F03G7/06G03F7/2039H01L21/0274
Inventor 戈斯·德弗里斯埃德温·比伊斯尤韦·米莰
Owner ASML NETHERLANDS BV