Three-phase dry type magnetic voltage regulator driver for driving cathodic power supply for processing niobium-silicon alloy

Abstract

The invention discloses a three-phase dry type magnetic voltage regulator driver for driving a cathodic power supply for processing niobium-silicon alloy. The driver utilizes a reference control voltage signal module to generate needed standard voltage signals and carries out reversed-phase amplification through a control voltage operational amplifier module. After amplitude is regulated by a control voltage regulation potentiometer, a driving operational amplifier carries out operational processing and power amplification on the regulated voltage signal and a current feedback signal to driveand control a driving power amplifier. By controlling the current magnitude of a voltage regulator coil, the driving power amplifier changes the magnetic flux of a three-phase dry type transformer inorder to regulate the output power of the cathodic power supply. An experiment indicates that the three-phase dry type magnetic voltage regulator driver for driving the cathodic power supply for processing niobium-silicon alloy can ensure the output of the cathodic power supply to have a smooth controllable on-load stepless voltage regulation characteristic; and has the advantages of reliable operation and low high-frequency noise.

Description

technical field [0001] The present invention relates to a cathode power supply for target material processing using an electron beam exposure machine, more particularly, a three-phase dry magnetic voltage regulator driving device for driving the cathode power supply for processing niobium-silicon alloys. Background technique [0002] Electron beam exposure system is a high-performance complex system integrating electron optics, precision machinery, automatic control, ultra-high vacuum and other technologies. It has many types of controlled quantities, wide control range and high precision requirements. Therefore, it requires the control computer to have the functions of storing a large amount of graphic data, real-time response, high reliability, continuous and stable work for a long time, and realizing comprehensive control. [0003] In the book "Electron Beam Exposure Micro-Nano Processing Technology" edited by Gu Wenqi, "Chapter 2 Electron Optical System in Electron Beam ...

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Problems solved by technology

[0006] In order to improve the existing electron beam exposure system when processing niobium-silicon alloys, the output power of the cathode power supply is unstable, which easily causes fluctuations in the electron beam current, th

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