Laser discharge chamber device of gas CO2 laser
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
- Publication Date
- 2009-09-23
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to a gas laser, in particular to gas TEA CO with high voltage, high current, high pulse energy and high repetition rate 2 Laser discharge chamber device for lasers. Background technique
[0002] For continuous output CO 2 Laser or pulsed laser gas CO 2 All lasers require the laser discharge cavity to work in a uniform glow discharge state. In order to obtain higher power laser output, it is necessary to inject a large amount of electric energy into the laser discharge cavity through the energy storage charging and discharging system of the laser, and maintain a uniform field in the laser discharge cavity under a stable range of working gas pressure and high voltage and high current. Glow discharge to avoid the occurrence of arc discharge, which is a high-power gas CO 2 Lasers (especially pulsed gas CO 2 Laser) technology is difficult to solve the key problems. Due to the laser discharge process, there are transition factors ...