Exposure device and exposure method

Abstract

PROBLEM TO BE SOLVED: To increase utilization efficiency of a device by reducing a time for exchanging workpieces.SOLUTION: Plural workpiece trays 6A-6D are prepared and made attachable / detachable to / from a base 5, and one of the workpiece trays 6A-6D is mounted to the base 5, so as to constitute a workpiece stage 4. The workpiece trays 6A-6D are separated from the base 5. For example, plural workpieces W are loaded on the workpiece tray 6A and located on the base 5, each one of the workpieces W is aligned. Lights from a light radiation part 1 are radiated to the workpiece W via a mask M, so as to sequentially expose the workpiece. While the workpieces W on the workpiece tray 6A is exposed, the unprocessed workpieces W are loaded on the other workpiece trays 6B-6D. When the exposure processing is completed, the workpiece tray 6A is removed, and the work trays 6B-6D, on which the unprocessed workpieces are loaded, are located on the base 5, so as to expose the workpieces. Also, at the same time, the exposed workpieces W are collected from the workpiece tray 6A.

Description

technical field [0001] The present invention relates to an exposure device and an exposure method for irradiating a workpiece on a workpiece stage with light emitted from a light irradiation unit through a pattern-formed mask. Background technique [0002] In the manufacture of various electrical components such as semiconductor devices, liquid crystal substrates, micro machines, etc. that require micro-size processing, in order to form various electronic components on the workpiece, patterned Mask A process in which light is irradiated onto a workpiece to expose a mask pattern on the workpiece. [0003] Figure 8 It is a perspective view of a configuration example of a conventional exposure apparatus. [0004] The exposure apparatus is composed of a light irradiation unit 1 that emits exposure light, a mask table 2 that holds a mask M on which a pattern to be exposed is formed, a work table 4 that holds a workpiece to be exposed, and a surface that is formed on the mask M....

AI Technical Summary

Problems solved by technology

This is because, during the alignment and exposure processing of the workpiece, if other workpieces are carried in and out of the work table on which the workpiece is placed, the exposure may be adversely affected by the movement of the workpiece during the alignment and exposure processing. high sex

[0025] As mentioned above, in the past, the ratio of the workpiece exchange time to the total exposure processing time was high, and the utilization efficiency of the equipment was reduced.

In addition, in order to shorten the exchange time of workpieces, it is conceivable to prepare two workpiece tables, but there is a problem that the device is complicated and expensive

Images