Treatment method for removing arsenic and COD in wastewater in gallium arsenide wafer production treatment simultaneously

Abstract

The invention relates to a treatment method for removing arsenic and COD in wastewater in gallium arsenide wafer production treatment simultaneously and belongs to the technical field of wastewater treatment. The method includes delivering waste water to an adjusting reaction tank, removing dichlord isocyanurice acid in raw water through the oxidation-reduction reaction and lifting wastewater subjected to the treatment to a coagulating precipitation tank through a pump to conduct sequential batch type coagulating sedimentation reaction. The process flow sequentially includes water feeding, chemical feeding, coagulating, precipitating and water discharging. Treated wastewater is lifted to a sequential batch type activated sludge tank from a middle tank through the pump to be subjected to aerobic biological treatment. The process flow sequentially comprises water feeding, aeration, sedimentation and water discharging. The arsenic and COD density in finally discharged water can achieve the standard of one-grade B in<<pollutant discharge standard of town wastewater treatment factory>>(GB18918-2002). The treatment method can simultaneously remove pollutants including arsenic, dichlord isocyanurice acid, COD and the like in the wastewater in gallium arsenide wafer production treatment, is high in treatment efficiency and high in operation stability.

Description

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AI Technical Summary

Benefits of technology

This technology helps clean up harmful substances like arsine (As) or chloraosulfonimides (NaCDIs), which are used during manufacturing processes for semiconductors. It works effectively with both chemical methods that use sulfur dioxide gas and physical techniques called ion implantation.

Problems solved by technology

The technical problem addressed in this patented text relates to treating galliaras containing both heavy metallics such as arsine or selenium together with small amounts of organically bound impurity elements like sulfur dioxide gas which may harm biological systems used for purification purposes during production. Current technologies require multiple steps involving different types of equipment, leading to increased operational cost and potential environmental hazards associated therewith.

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