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Photo-etching machine silicon wafer stage driving apparatus

A technology of a driving device and a silicon wafer stage, which is applied in the field of photolithography machines, and can solve the problem that the vertical position of the roller of the driving device cannot be retracted, etc.

Active Publication Date: 2014-08-20
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] The purpose of the present invention is to provide a silicon wafer table driving device for a lithography machine to solve the problem that the vertical position of the roller cannot be retracted in the non-working state of the existing driving device

Method used

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  • Photo-etching machine silicon wafer stage driving apparatus
  • Photo-etching machine silicon wafer stage driving apparatus
  • Photo-etching machine silicon wafer stage driving apparatus

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Embodiment Construction

[0030] In order to make the above-mentioned features and advantages of the present invention more comprehensible, exemplary embodiments are given below together with accompanying drawings and described in detail as follows.

[0031] In the actual use of the lithography machine (including the integration of the lithography machine system, the maintenance of the whole machine, etc.), it is necessary to periodically move the silicon wafer stage out of the main body of the lithography machine or restore its original position. However, the weight of the silicon wafer table is relatively large, and a driving device is needed to make it easier to move. However, the driving device in the prior art has the problem that the vertical position of the rollers cannot be retracted. This is mainly because the existing driving device itself There is no adjustment to the rollers, and the rollers can only produce vertical force under the action of external force, which makes it impossible to chan...

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Abstract

The invention discloses a photo-etching machine silicon wafer stage driving apparatus comprising an installation seat. A connection rack arranged between two ends of the installation seat. A driving unit is arranged on one end of the installation seat. A connection plate has one end connected to the driving unit and the other end extending towards the connection rack. A reed has one end arranged on the connection rack and the other end connected with a roller unit. A jacking plate is arranged between the two ends of the reed. The driving unit drives the connection plate to move towards the connection rack, such that the other end of the connection plate acts forces on the jacking plate. The driving apparatus is has the advantages of simple structure, small vertical size, and recoverable vertical position. With the driving apparatus, a silicon wafer stage can be rapidly, simply and flexibly moved.

Description

technical field [0001] The invention relates to the technical field of lithography machines, in particular to a silicon wafer stage driving device for a lithography machine. Background technique [0002] Photolithography is a very important process in the semiconductor manufacturing process. It is a process of sequentially transferring chip patterns on a series of reticles to corresponding layers of silicon wafers through exposure. It is considered to be the core step in large-scale integrated circuit manufacturing. . This series of complicated and time-consuming photolithography processes are mainly completed by corresponding photolithography machines. [0003] Usually, the lithography machine is equipped with a silicon wafer stage, which is used to carry the silicon wafer and provide a motion platform for it to realize X and Y large-stroke exposure movements. However, in the actual use of the lithography machine (including the integration of the lithography machine syste...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 刘育
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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