Surface processing device and processing method of flexible base material
A flexible substrate and processing device technology, applied in the field of flexible substrate surface treatment devices, can solve the problems of long degassing time, low processing efficiency, low energy conversion efficiency, etc., to achieve increased degassing effect, high energy conversion efficiency, The effect of improving productivity
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Embodiment 1
[0036] The process parameters are as follows: set the working voltage to 1500V, the argon gas flow rate to 200Sccm, the power to 0.3KW, and the vacuum degree of the vacuum chamber to be 6.0E -2 Torr, the moving speed of the flexible substrate is 1.6m / min.
Embodiment 2
[0038] The process parameters are as follows: set the working voltage to 1500V, the argon gas flow rate to 450Sccm, the power to 0.45KW, and the vacuum degree of the vacuum chamber to be 5.8E -2 Torr, the moving speed of the flexible substrate is 1.45m / min.
[0039] The treatment effect is not only related to power and vacuum degree, but also related to the speed of the substrate. The slower the speed, the higher the processing energy per unit surface area, the faster the degassing, and the more obvious the surface modification. The surface modification effect can be judged by the dyne value. The dyne value of the substrate surface is less than 36 before being treated under the two process conditions of Example 1 and Example 2, and the dyne value of the substrate surface is greater than 56 after treatment.
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