Alignment compensation device and exposure device
A compensation device and micro-compensation technology, which are applied in photoplate-making process exposure devices, microlithography exposure equipment, optics, etc., can solve the problems of low alignment accuracy and difficult alignment compensation, and achieve the effect of improving alignment accuracy.
Active Publication Date: 2015-01-21
BEIJING BOE OPTOELECTRONCIS TECH CO LTD
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Problems solved by technology
[0006] The purpose of the present invention is to provide an alignment compensation device, system and exposure device to solve the problems of the existing alignment compensation device for local positions, difficulty in alignment compensation, and low alignment accuracy
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[0017] The alignment compensation device provided by the present invention includes an alignment compensation component with a photo-induced deformation effect, and a beam generating device. The light emitted by the beam generating device directly irradiates the above-mentioned alignment compensation component, and enables the alignment compensation component to be The irradiated part is deformed, and the corresponding position of the alignment compensation component is deformed by adjusting the direction of the light emitted by the beam generating device, thereby realizing high-precision alignment.
[0018] The alignment compensation device provided by Embodiment 1 of the present invention includes an alignment compensation component 5 and a beam generating device 6, such as figure 2 As shown, in the embodiment of the present invention, the beam generating device 6 is arranged at a position where the emitted light directly irradiates the set position of the alignment compensa...
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The invention discloses an alignment compensation device and an exposure device, aiming at solving the problem that the existing alignment compensation device is low in local part alignment accuracy. The alignment compensation device comprises an alignment compensation part with light-induced deformation effect, and a light beam generator, wherein the light beam generator is arranged at the position where the set part of the alignment compensation part can be directly irradiated by the light emitted by the light beam generator; the alignment compensation part comprises a compensation glass plate and a micro-compensation layer with light-induced deformation effect; and the micro-compensation layer has light-induced deformation effect, so that the part of the micro-compensation layer irradiated by the light emitted by the light beam generator can deform, and the compensation glass plate is driven to deform. The alignment compensation device and the exposure device can be used for controlling the deformation of any set positions of the alignment compensation part, thus realizing the alignment compensation for the local position, and improving the compensation accuracy.
Description
technical field [0001] The invention relates to the field of display panel manufacturing, in particular to an alignment compensation device and an exposure device. Background technique [0002] In the manufacturing process of liquid crystal display panels, the realization of each thin film layer usually needs to go through deposition, exposure, development and photolithography to form specific patterns. The photolithography process mainly forms photoresist patterns through masks. In order to achieve accurate alignment position, alignment control is required, but in actual production, alignment deviation often occurs, especially when the resolution of the panel is high, and the accuracy of the corresponding equipment often cannot meet the demand well. [0003] In the existing process of forming a photoresist pattern by using a mask plate, such as figure 1 The exposure device shown performs alignment control, and the ultraviolet light emitted by the high-pressure mercury lamp...
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IPC IPC(8): G03F7/20G03F9/00
Inventor 曲连杰
Owner BEIJING BOE OPTOELECTRONCIS TECH CO LTD