Electromagnetic scattering analysis method for ultra-high-speed flying targets
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- NANJING UNIV OF SCI & TECH
- Publication Date
- 2016-11-30
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Abstract
Description
technical field
[0001] The invention belongs to the rapid calculation technology of target electromagnetic scattering characteristics, in particular to an electromagnetic scattering analysis method applied to ultra-high-speed flying targets. Background technique
[0002] Due to the high flight speed (above Mach 3) and high flight altitude (above 20Km) of the ultra-high-speed flying target, the friction with the air during its flight will generate aerodynamic heat of several thousand degrees Celsius, making the surrounding air appear ionized. The ionic state exists. When the degree of ionization reaches a certain level, the ionized gas has plasma properties. At this time, the enveloping flow field near the surface of the flying target is usually called plasma enveloping flow field, re-entry plasma or plasma sheath, which means that the flying target is covered by plasma (normal rain, supersonic speed / Numerical Simulation of Hypersonic Plasma Flow Field and Research on Elec...