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Filament Changer and Filament Replacement Structure

A replacer and filament technology, applied in the direction of discharge lamps, gas discharge lamp parts, discharge tubes, etc., can solve the problems of heavy weight, increase the burden on replacement operators, etc., and achieve the effect of reducing the burden

Active Publication Date: 2016-05-18
NISSIN ION EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0014] In order to prevent the auxiliary vacuum container 1A from being crushed by the atmospheric pressure when the inside is evacuated, the auxiliary vacuum container 1A is formed of a metal body and thus heavy, so the installation and removal operations of the auxiliary vacuum container 1A are repeated many times. , will increase the burden on the replacement operator

Method used

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  • Filament Changer and Filament Replacement Structure
  • Filament Changer and Filament Replacement Structure
  • Filament Changer and Filament Replacement Structure

Examples

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Embodiment Construction

[0060] A filament changer 100 and a filament replacement structure 200 according to one embodiment of the present invention will be described with reference to the drawings.

[0061] The filament replacer 100 of this embodiment is used to replace the filament 61 of an ion source 300 that generates an ion beam for implanting ions into a liquid crystal glass substrate or a semiconductor substrate, for example, in manufacturing a liquid crystal display or a semiconductor device. In addition, the filament changer 100 can also be used to replace the filament 61 of the electron source that generates electron beams. Next, replacement of the filament 61 arranged in the plasma generation chamber of the vacuum chamber C serving as the ion source 300 will be described as an example.

[0062] For example figure 1 As shown, the ion source 300 is a multi-filament ion source in which a plurality of filaments 61 are arranged in the vertical direction. More specifically, the flanged current...

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Abstract

The present invention provides a filament changer and a filament replacement structure, which do not always take up extra space for replacing the filament, and can reduce the number of loading and unloading of the auxiliary vacuum container when the filament is replaced. The filament changer includes the auxiliary vacuum container and the operating rod. The operating rod penetrates through the auxiliary vacuum container, and its front end is installed on the filament support structure in the auxiliary vacuum container, and is used to operate the control rod from the vacuum chamber when the auxiliary vacuum container is in a vacuum exhausted state. pulling out the filament into the auxiliary vacuum container, the auxiliary vacuum container comprising: a container body formed in contact with the outside of the vacuum chamber and detachably mounted on the outside of the vacuum chamber, through the operation An installation port through which the filament pulled out by a rod passes and a filament removal port through which the filament passes when replacing the filament; and a cover capable of opening or closing the filament removal port.

Description

technical field [0001] The present invention relates to a filament changer and a filament replacement structure used when replacing a filament used in a vacuum chamber such as an ion source or an electron source. Background technique [0002] For example, in the manufacture of liquid crystal displays and semiconductor devices, ion implanters are used to implant ions into liquid crystal glass substrates and semiconductor substrates. An ion source for generating plasma and extracting ion beams is provided in the ion implantation apparatus. [0003] In the ion source, a plurality of filaments protrude from a plasma generation chamber that communicates with a processing chamber that irradiates an ion beam to a substrate and maintains a vacuum, and the gas introduced into the plasma generation chamber ionized to produce plasma. [0004] However, the filament may be deteriorated or damaged as the ion source is operated over time, so that the filament needs to be replaced periodi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/02H01J37/08
CPCH01J5/14H01J37/08H01J61/34H01J2237/186
Inventor 滝上佳宏中矢良田村茂久
Owner NISSIN ION EQUIP CO LTD
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