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A coating device

A technology of coating device and target material, applied in sputtering coating, vacuum evaporation coating, ion implantation coating and other directions, can solve the problems of poor effect, long magnetic stripe residence time, large target material consumption, etc., to ensure uniformity The effect of improving the utilization rate of target materials

Inactive Publication Date: 2016-01-06
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this movement method can only improve the uniformity to a certain extent, and the effect is poor.
At the same time, due to the long residence time of the magnetic strip at the edge of the target, the consumption of the target is large, resulting in a very low utilization rate of the target

Method used

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  • A coating device
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Examples

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Embodiment Construction

[0021] The principles and features of the present invention are described below in conjunction with the accompanying drawings, and the examples given are only used to explain the present invention, and are not intended to limit the scope of the present invention.

[0022] Such as image 3 and Figure 4 As shown, the invention provides a kind of coating device, and described coating device comprises:

[0023] a substrate carrying plate (not shown in the figure) for carrying the substrate 100;

[0024] A target carrying plate (not shown in the figure) for carrying the target 200 and making the target 200 and the substrate 100 opposite to each other;

[0025] A single magnetic strip 400 disposed on the side of the target supporting plate away from the substrate supporting plate, the magnetic strip 400 can at least move within a predetermined range of motion B, and the predetermined range of motion B includes at least : a target area B1 corresponding to the area where the targe...

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PUM

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Abstract

The invention provides a film coating device. The film coating device comprises a substrate bearing plate for bearing a substrate, a target material bearing plate for bearing a target material which is opposite to the substrate, and single magnetic bar arranged on the side, of the target material bearing plate, far from the substrate bearing plate, wherein the magnetic bar at least can move within a preset movement range; the preset movement range at least comprises a target material area corresponding to the area where the target material is positioned, and a non-target material area corresponding to an area outsides the target material. The film coating device further comprises a control mechanism for controlling the magnetic bar to do uniform motion in the target material area. The preset movement range of the magnetic bar of the film coating device is far greater than that of the target material; when the magnetic bar moves to the target material area, the magnetic bar can do uniform motion, so that the film forming uniformity is guaranteed to the maximum extent; as magnetic field intensities in all positions of the target material are similar, the utilization rate of the target material can be greatly improved.

Description

technical field [0001] The invention relates to the technical field of film coating, in particular to a film coating device. Background technique [0002] At present, when physical vapor deposition (Physical Vapor Deposition, PVD) is required for multi-layer coating on the substrate, it is generally necessary to place the substrate in a PVD coating device for coating. [0003] The specific process of vacuum magnetron sputtering in the PVD coating device is as follows: the high vacuum chamber is filled with an inert gas (usually argon), and the permanent magnetic strip forms a magnetic field of 250 to 350 gauss on the surface of the target, forming a positive alternating electromagnetic field. Under the action of the electric field, the argon gas is ionized into positive ions and electrons, and a certain negative high voltage is added to the target. The electrons emitted from the target are subjected to the action of the magnetic field and the ionization probability of the w...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35
Inventor 孙泉钦谢濒锋王一鸣
Owner BOE TECH GRP CO LTD