Coating method and coating device

A coating and loading technology, which is applied to the surface coating liquid device, coating, pretreatment surface, etc., can solve the problems of time-consuming processing, low practicability, lack of stability, etc., and achieve the effect of shortening the cycle time

Inactive Publication Date: 2014-04-16
TOKYO OHKA KOGYO CO LTD
View PDF8 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] However, for example, when a spin coater is directly applied to the coating of the diffusion material, it takes time to process, and it is impossible to economically manufacture substrates for solar cells, which has the problem of low practicality.
In addition, since the substrate for a solar cell is thinner than a wafer, for example, when the above-mentioned spin coater is directly applied to the coating of a diffusion material, the substrate for a solar cell held on the chuck part will sag downward, thereby having a lack of stability. sex problem

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Coating method and coating device
  • Coating method and coating device
  • Coating method and coating device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0061] Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

[0062] figure 1 (a) is a top view of a substrate processing apparatus including a coating apparatus of the present invention, figure 1 (b) is figure 1 (a) A cross-sectional view taken along line A-A. figure 2 It is a block diagram showing the electrical configuration of the substrate processing apparatus 100 . The substrate processing apparatus of the present embodiment is an apparatus for applying and drying a diffusion material for diffusing impurities on a solar cell substrate constituting a solar cell. Substrate) coated with diffusion material and used.

[0063] Hereinafter, when describing the structure of the substrate processing apparatus 100 , for the sake of simplicity of description, the directions in the drawings will be described using the XYZ coordinate system. The longitudinal direction of the substrate processing apparatus 100 , that is, the trans...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a coating method and a coating device capable of shortening beats and economically and stably coating liquid material on a substrate. By adopting the coating method, a chuck part for holding a substrate is rotated, so that liquid material is diffused and coated on the surface of the substrate. The coating method comprises a loading process (S1), wherein a substrate is loaded on a chunk part positioned at a substrate loading position; a moving process (S3) for moving the chunk part with a loaded substrate to a rotating position for being subjected to rotation operation; and a rotating process (S4), wherein the chunk part is rotated at a rotating position. A dropping process (S2) is arranged between the loading process (S1) and a moving process (S3), wherein the liquid material is dropped on the surface of the chunk part.

Description

[0001] This application is a divisional application of an invention patent application with an application date of July 27, 2011, an application number of 201110212716.4, and an invention title of "coating method and coating device". technical field [0002] The present invention relates to a coating method and a coating device. [0003] This application claims priority based on Japanese Patent Application No. 2010-170475 filed in Japan on July 29, 2010 and Japanese Patent Application No. 2010-170476 filed in Japan on July 29, 2010, the contents of which are incorporated herein. Background technique [0004] In recent years, solar cells have attracted attention for various applications. The manufacturing process of the solar cell substrate includes a step of applying a diffusion material to the surface of the semiconductor substrate. An economical and high-speed tact device is required for such a coating device for solar cells. [0005] However, conventionally, when manufa...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B05D1/26B05D3/12B05C11/08B05C13/02B05C11/10
Inventor 大石诚士
Owner TOKYO OHKA KOGYO CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products