The invention relates to the field of photovoltaic equipment, and discloses a high-productivity PECVD (
Plasma Enhanced
Chemical Vapor Deposition)
system suitable for plating various film
layers and a
coating process thereof, and the PECVD
system comprises a sheet feeding preheating cavity, a one-stop
coating module and a cooling sheet discharging cavity which are sequentially connected through gate valves. The sheet inlet preheating cavity comprises a sheet inlet and outlet stacking cavity and a heating plate, and the cooling sheet outlet cavity comprises a sheet inlet and outlet stacking cavity and a cooling plate. The one-stop
film coating module comprises an isolation cavity and a plurality of process cavities for
coating different film
layers, and the isolation cavity is arranged between two adjacent process cavities through a
gate valve; and each process cavity comprises a plurality of deposition cavities which are communicated with one another and can work independently. And a stack lifting mechanism is arranged in each of the in-and-out
wafer stack cavity and the isolation cavity. The coating process adopts the PECVD
system and comprises the following steps: S1, feeding and preheating; s2,
film coating is conducted, specifically, a one-stop
film coating mode is adopted for film coating, and an isolation process is set; and S3, cooling and discharging. According to the invention, the length of a
production line can be shortened, the equipment and
land occupation cost is saved, and the productivity efficiency can be improved.