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Atmospheric molecular contamination control with local purging

A gas purification, local technology, applied in the field of optical metrology, can solve the problems of atmospheric molecular pollution and limited accuracy

Active Publication Date: 2014-04-30
KLA TENCOR CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] However, the accuracy of most modern optical systems is limited by atmospheric molecular contamination "AMC" that accumulates on the surface of the film and distorts film thickness or other physical properties measured or analyzed by an ellipsometer or other optical system

Method used

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  • Atmospheric molecular contamination control with local purging
  • Atmospheric molecular contamination control with local purging
  • Atmospheric molecular contamination control with local purging

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Embodiment Construction

[0023] Reference will now be made in detail to the disclosed subject matter which is illustrated in the accompanying drawings.

[0024] Usually refer to Figures 1A to 3 , describing a system and method for locally decontaminating a portion of the surface of a wafer according to the present invention. Optical systems are commonly used to measure or analyze the physical properties of thin films formed on substrates commonly used in semiconductor manufacturing, such as silicon wafers. Atmospheric Molecular Contamination (“AMC”), such as hydrocarbons and other contaminants, tends to accumulate on the surface of the wafer and prevent the optical system from obtaining accurate information about the physical properties of one or more wafers being measured or analyzed by the optical system. information. The present invention is directed to a system for preventing AMC from accumulating on the surface of a wafer by locally purging at least a portion of the surface of the wafer with a...

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Abstract

A local purging tool for purging a portion of a surface of a wafer with purging gas is disclosed. The purging tool includes a purging chamber configured to contain purging gas within a cavity of the purging chamber, a permeable portion of a surface of the purging chamber configured to diffuse purging gas from the cavity of the chamber to a portion of a surface of a wafer, and an aperture configured to transmit illumination received from an illumination source to a measurement location of the portion of the surface of the wafer and further configured to transmit illumination reflected from the measurement location to a detector.

Description

[0001] Cross References to Related Applications [0002] This application relates to and claims the benefit of the earliest available effective filing date from the applications listed below ("related applications") (e.g., claiming the earliest available priority date for an application other than the provisional patent application or Claim the provisional patent application, any and all parent applications, grandfather applications, great-grandfather applications, etc. of related applications under 35 USC § 119(e)). [0003] Related applications : [0004] For purposes of the additional USPTO statutory requirements, this application constitutes the July 4, 2011 application, Application Serial No. 61 / 504,271 Inventors Hidong Kwak, Ward Dixon, Towers · Torsten Kaack, Ning Yi Neil Wang, and Jagjit Sandhu and titled "Controlling Atmospheric Molecules with Nitrogen Local Purification Following Atmospheric Molecular Contamination (AMC) Cleanup" Pollution (ATMOSPHERIC MOLECULAR C...

Claims

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Application Information

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IPC IPC(8): G01B11/06B08B5/02
CPCG01B11/0641H01L22/12G01B2210/56H01L21/67017B08B5/02H01L2924/0002H01L2924/00G01B11/06G01N21/21G01N21/55
Inventor 希佟·郭沃德·狄克逊托斯顿·卡克宁-易尼尔·王贾格吉特·桑德胡
Owner KLA TENCOR CORP