Silicon wafer eccentric tester
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- DANYANG XINYE OPTICAL INSTR
- Publication Date
- 2014-09-17
- Estimated Expiration
- Not applicable · inactive patent
Smart Images
Figure 1
Abstract
Description
technical field
[0001] The invention relates to the technical field of optical element processing, in particular to a silicon wafer eccentricity tester for measuring the eccentricity of a silicon wafer. Background technique
[0002] In recent years, with the progress and development of science and technology, in various optical systems used in digital cameras, video cameras, etc., silicon wafers are often used to improve optical performance and miniaturize the optical system. Along with this, a method of measuring the amount of eccentricity of a silicon wafer is required.
[0003] Traditional eccentricity measuring instruments measure the eccentricity of such optical components by refracting light emitted by light sources through transparent optical components. However, silicon wafers, as an opaque solid, cannot be measured by this method. Moreover, most of the mechanical equipment used in this traditional measurement of the eccentricity of the optical element is imported f...