Drawing device and drawing method
A technology of main scanning direction and sub-scanning, which is applied in the direction of exposure device, optics, and optomechanical equipment in the photolithography process, which can solve the problems that the automatic focusing mechanism cannot function normally, and the drawing accuracy of the band-shaped area is reduced, so as to improve the drawing Accuracy, easy parts management, effect of equipment cost reduction
Active Publication Date: 2016-09-14
DAINIPPON SCREEN MTG CO LTD
View PDF8 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Therefore, sometimes the autofocus mechanism cannot function properly
Therefore, the drawing accuracy of the band-shaped region near the substrate end may be reduced
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0068] Hereinafter, embodiments of the present invention will be described with reference to the drawings. In addition, in the drawings, in order to facilitate understanding, the size and number of each part may be exaggerated or simplified.
[0069]
[0070] figure 1 It is a perspective view showing an overview of the drawing device 100 of the embodiment. In addition, figure 2 It is a plan view showing an overview of the drawing device 100. and, image 3 It is a bus wiring diagram of the drawing device 100. in figure 1 Here, for the convenience of illustration and description, the Z-axis direction is defined as the vertical direction, and the XY plane is the horizontal plane. However, this is defined to facilitate understanding of the positional relationship and does not limit the directions described below. The same applies to the following figures. In addition, in figure 2 Here, for convenience of description, the bridge structure 11 and the optical head 33 are indicated ...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
The invention provides a technique which improves drawing precision of a pattern of a belt-shaped area at an end of a substrate. A drawing device (100) draws the pattern on the substrate (90) through irradiating strip-shaped drawing light to the substrate on which a photoreceptor is formed. The drawing device is provided with the components of: a plurality of optical heads (33a-33e) which irradiates the drawing light; a secondary scanning mechanism (221) which makes the optical heads (33a-33e) move relative to the substrate in an auxiliary scanning direction (+x direction); and a main scanning mechanism which make the optical heads move relative to the substrate in a main scanning direction (+y,-y direction). Additionally, the drawing device is provided with an automatic focusing mechanism (6) which adjusts the focus position of the drawing light that is radiated from the plurality of optical heads. The automatic focusing mechanism for partial optical heads (33b-33e) in the plurality of optical heads takes a position which offsets from the central position of the drawing light to the auxiliary scanning direction on the substrate as a detecting position for detecting separating distance variation.
Description
Technical field [0001] The present invention relates to a substrate for a color filter (color filter) provided in a semiconductor substrate, a printed substrate, a liquid crystal display device, etc., a glass substrate for a flat panel display, a substrate for a magnetic disk, etc. provided in a liquid crystal display device and a plasma display device. A technology in which various substrates such as substrates for optical discs and panels for solar cells (hereinafter referred to as "substrates") are irradiated with light to draw patterns on the substrates. Background technique [0002] The following exposure devices (so-called drawing devices) are known, which do not use masks or the like when exposing patterns such as circuits on a photosensitive material coated on a substrate, but use modulated data based on recorded patterns The light (tracing light) scans the photosensitive material on the substrate, thereby directly exposing the pattern on the photosensitive material. For...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/207
CPCG03F7/20G03F7/26H01L21/027
Inventor 城田浩行重本宪永井妥由
Owner DAINIPPON SCREEN MTG CO LTD