Radiation shielding for substrate holders

Abstract

A reaction chamber comprising: a substrate support member positioned within the reaction chamber, a reaction chamber having a first region and a second region, a shield positioned within the second chamber and movable with the substrate support member, wherein , the shield is adjacent to at least the bottom surface of the substrate support member.

Description

[0001] Cross-references to related applications [0002] This application claims the benefit of priority to US Patent Provisional Application No. 61 / 563,428, filed November 23, 2011, the disclosure of which is incorporated herein by reference. Background technique [0003] Heating a substrate being processed in a substrate processing tool can be difficult. Variations in substrate heating can result in temperature variations within the substrate. Such intra-substrate temperature variations can result in non-uniformity of processing within the substrate. In some settings, a substrate exhibiting such non-uniformity can yield defective devices. In addition, precipitation products may settle in the lower process chamber, resulting in a decrease in temperature within the reaction chamber and, therefore, increased energy consumption to overcome insufficient heating. Additionally, accumulation of precipitated products within the chamber can result in the need to clean the chamber ...

AI Technical Summary

Problems solved by technology

Such intra-substrate temperature variations can result in non-uniformity of processing within the substrate

In some setups, substrates exhibiting such non-uniformity can yield defective devices

In addition, precipitation products can settle in the lower process chamber, leading to a decrease in the temperature in the reaction chamber, thus increasing energy consumption to overcome insufficient heating

Additionally, accumulation of precipitated products in the chamber can result in the need to clean the chamber prematurely and increase costs

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