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A kind of cutting method of mems wafer

A cutting method and wafer technology, which are applied in fine working devices, processes for producing decorative surface effects, decorative arts, etc., can solve problems such as difficulty, excessive cutting of fragments, damage to device structure, etc., and achieve the method steps Simple and easy to damage effects

Active Publication Date: 2015-12-09
SEMICON MFG INT (SHANGHAI) CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] In view of the above-mentioned shortcomings of the prior art, the purpose of the present invention is to provide a method for cutting MEMS wafers, which is used to solve the difficulty in cutting and aligning MEMS wafers in the prior art and the difficulty in cutting caused by excessive fragments generated during the cutting process. , damage to the device structure, easy damage to the cutting tool, etc.

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  • A kind of cutting method of mems wafer
  • A kind of cutting method of mems wafer
  • A kind of cutting method of mems wafer

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Embodiment Construction

[0038] The embodiments of the present invention are described below through specific specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification. The present invention can also be implemented or applied through other different specific embodiments, and various details in this specification can also be modified or changed based on different viewpoints and applications without departing from the spirit of the present invention.

[0039] see Figure 1 to Figure 10 . It should be noted that the diagrams provided in this embodiment are only to illustrate the basic concept of the present invention in a schematic way, and the drawings only show the components related to the present invention rather than the number, shape and number of components in actual implementation. For dimension drawing, the type, quantity and proportion of each component can be arbitrarily changed...

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Abstract

The invention provides a method for cutting MEMS (micro-electromechanical system) wafers. The method includes steps of 1), cutting partial non-bonding regions at the edges of covering wafers of the MEMS wafers and removing the partial non-bonding regions to expose device patterns of device wafers; 2), pre-cutting the covering wafers in partition regions among various MEMS cavities along first directions to form a plurality of cutting channels, and reserving covering wafers with preset thicknesses; 3), cutting the partition regions among the various MEMS cavities along second directions perpendicular to the first directions; 4), cutting the partition regions among the various MEMS cavities along the first directions to separate the covering wafers of the various MEMS cavities. The method has the advantages that the problem of difficulty in alignment when wafers without patterns on the surfaces of the wafers are cut can be solved by the aid of the method, high-quality cavity structures can be manufactured by the method, each wafer with an unpolluted PAD on a CMOS (complementary metal oxide semiconductor) surface of the wafer can be obtained, and the problem of easiness in damage to equipment and blades can be solved by the aid of the method; cutting equipment and a cutting process for the method are compatible to the traditional process, the steps of the method are simple, and the method is applicable to industrial production.

Description

technical field [0001] The invention relates to a cutting process of a semiconductor device, in particular to a cutting method of a MEMS wafer. Background technique [0002] Micro-electromechanical system MEMS mainly includes micro-mechanisms, micro-sensors, micro-actuators and corresponding processing circuits. Frontier disciplines. [0003] The development of MEMS technology has opened up a new technical field and industry. Micro-sensors, micro-actuators, micro-components, micro-mechanical optical devices, vacuum micro-electronic devices, power electronic devices, etc. made by MEMS technology are used in aviation, aerospace, automobile, There are very broad application prospects in biomedicine, environmental monitoring, military and almost all fields that people come into contact with. MEMS technology is developing into a huge industry, just like the great changes brought to mankind by the microelectronics industry and the computer industry in the past 20 years, MEMS is ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B28D5/00B81C1/00
Inventor 肖启明江博渊
Owner SEMICON MFG INT (SHANGHAI) CORP