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Capacitive micromachined accelerometer and manufacturing method thereof

A technology of capacitive micromachines and accelerometers, applied in the direction of measuring acceleration, speed/acceleration/impact measurement, measuring devices, etc., can solve the problems of complex structure, process error, large output nonlinearity, etc., and achieve the effect of high sensitivity

Inactive Publication Date: 2015-09-16
NANJING UNIV OF INFORMATION SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Other types of micro-mechanical accelerometers have complex structures, dependence on process errors, and large shortcomings of output nonlinearity

Method used

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  • Capacitive micromachined accelerometer and manufacturing method thereof
  • Capacitive micromachined accelerometer and manufacturing method thereof
  • Capacitive micromachined accelerometer and manufacturing method thereof

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Embodiment Construction

[0030] The technical solution of the invention will be described in detail below in conjunction with the accompanying drawings.

[0031] The capacitive micromachined accelerometer corresponding to the present invention is mainly used to measure the one-dimensional acceleration in the horizontal direction in the plane, and the accelerometer is as figure 2 As shown, it consists of upper, middle and lower layers. The upper layer is the polysilicon active structure shielding layer, the middle layer is the polysilicon detection capacitor and electrical signal lead layer, and the lower layer is the silicon wafer base, supporting the two layers above it. The design of the capacitive micromachined accelerometer corresponding to the present invention mainly includes two layers, and the polysilicon movable structure shielding layer is the movable mass system S.

[0032] Active mass system S such as figure 2 , image 3 As shown, it consists of mass M, first connecting beam S12, second ...

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Abstract

The invention discloses a capacitive micro mechanical accelerometer and a manufacturing method thereof, and belongs to the technical field of micro mechanical sensors. The accelerometer comprises a silicon chip base, an insulating layer formed on the silicon chip base, a capacitance detecting layer deposited on the insulating layer and a polycrystalline silicon movable structure shielding layer, wherein the polycrystalline silicon movable structure shielding layer is suspended in the air through the supporting from the capacitance detecting layer; a mass block in the polycrystalline silicon movable structure shielding layer drives a supporting beam to shift under the action of acceleration; an electric field line between capacitance detecting pole plates can be changed, and the capacitance variation value obtained through the variation of the electric field line is the measured acceleration information. The capacitive micro mechanical accelerometer designed by utilizing the fringe field effect has high sensitivity under wide range, and can be used for detecting the capacitance under the action of incentive capacitance and external incentive voltage, so that the accelerometer has the self-detecting function and avoids adsorption failure.

Description

technical field [0001] The invention discloses a capacitive micro-mechanical accelerometer and a manufacturing method thereof, in particular to a capacitive micro-mechanical accelerometer based on fringe electric field effects and a manufacturing method thereof, belonging to the technical field of micro-mechanical sensors. Background technique [0002] Micromachined accelerometers are one of the most successful devices in microelectromechanical systems. They have broad application prospects in the military and civilian fields, and have huge social and economic benefits. Improving performance indicators is currently the research focus in the field of micromachined accelerometers. . [0003] The capacitive micromechanical accelerometer acts on the mass block through acceleration, the mass block drives the movement of the support beam, and the comb or plate on the mass block also moves in position accordingly. When the capacitance pair formed by the comb tooth or plate and the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01P15/125
Inventor 刘恒于步云孟瑞丽孙冬娇
Owner NANJING UNIV OF INFORMATION SCI & TECH