Stitch structure of double-chain-ring seam

A double link and stitch technology, which is applied to the thread cutting mechanism in the sewing machine, the thread hook for sewing machines, the ferrule mechanism for sewing machines, etc., can solve the problem of stitch opening, side wave and movement, stitch M opening and other problems to achieve the effect of preventing the stitches from opening and strengthening the pressing

Inactive Publication Date: 2015-01-14
YAMATO SEWING MASCH MFG CO LTD
View PDF8 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] There are following problems in the structure of the stitches M of the general double-chain loop stitching formed by the double-chain loop sewing machine: Figure 27 As shown, the end of the looper thread 10 that is cut off at the end of sewing is Figure 27 When stretched in the direction indicated by the middle arrow, the looper thread 10 will be pulled out from the final suture loops 20a, 20b formed by the sutures 20, 20. There will be open lines on the whole of the stitch M
[0010] However, in the currently proposed anti-opening method, there are the following problems: Figure 28 and Figure 29 The y-direction of the looper thread 10 is easy to pull out from the final suture loops 20a, 20b when the tensile force is applied in the y direction. The whole stitch will produce open lines
[0011] For example, in the case of a thinner or softer fabric to be sewn, since the sewing is performed under a state where the applied tension of the suture and the looper thread is small, a good sewing effect can be obtained. Therefore, the suture ring 20a , 20b are insufficient to fasten the looper thread 10, as a result, the above-mentioned open thread is more likely to occur
[0012] Particularly, in the case of the stitches of the double chain loop stitching formed by one needle, the looper thread 10 is only interwoven with the last stitch loop 20a of the stitching thread 20 in the state of being intertwined, therefore, Pull-out occurs only by applying a slight tensile force, so the effect of preventing thread opening is very low

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Stitch structure of double-chain-ring seam
  • Stitch structure of double-chain-ring seam
  • Stitch structure of double-chain-ring seam

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0068] Hereinafter, an embodiment of the present invention will be described based on the drawings.

[0069] figure 1 It is a perspective view of the overall appearance of the horizontal cylinder type double-link sewing machine of the first embodiment used to obtain the stitch structure of the present invention, figure 2 and image 3 It is a perspective view showing the structure of the main part of the stitch opening prevention device installed on the horizontal cylinder type double-link sewing machine of the first embodiment, Figure 4 It is a plan view showing the structure of the main part of the above-mentioned stitch opening prevention device. In the following instructions, use Figure 2 ~ Figure 4 The "left, right" and "front, back" expressions shown by the arrows in the middle will explain. Here, "front" is the side close to the sewing manufacturer, "back" is the side away from the sewing manufacturer, and "left and right" are "left and right" when viewed from the front ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

A method for preventing seam ravel of multi-thread chain stitches is provided. After normal sewing is terminated with a looper set in a forward movement state, a state in which a needle thread loop caught by the looper is subjected to position-holding at a position closer to a forward movement end of the looper than a descent position of a needle is maintained until the needle descends through the needle thread loop caught by the looper. Thereafter, the position-holding of the needle thread loop is released to permit a sewing action for at least one stitch, thereby allowing the needle thread loop to be self-looped with a needle thread held by the needle. This surely strongly prevents the seam ravel of multi-thread chain stitches formed by the single needle, irrespective of the dimension of tension applied to the needle thread and the looper thread.

Description

[0001] The patent application of the present invention is the application number 201210338785.4, the filing date is September 13, 2012, and the title is "method for preventing stitch opening of double-chain loop sewing, anti-stitch opening device of double-chain loop sewing machine and double-chain loop The divisional application of the invention patent application for the stitch structure of seams. Technical field [0002] The present invention relates to a stitch structure of a double-chain loop seam. The stitch structure of the double-chain loop seam uses a double-chain loop sewing machine mainly represented by a horizontal cylinder type. The thread of the double-chain loop seam is formed by suture and looper thread It can prevent the stitches from being split at the sewing end of the double-chain loop stitch. Background technique [0003] A general horizontal cylinder type double-link sewing machine includes: a needle that holds the suture and raises and lowers it; and a loope...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): D05B1/10D05B57/02
CPCD05B1/10D05B61/00D05B65/02D05B53/00D05B55/14D05B65/06
Inventor 桥本诚冶
Owner YAMATO SEWING MASCH MFG CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products