Phase-controlled model-based overlay measurement systems and methods
A technology of modeling and imaging system, applied in measurement device, photoengraving process of pattern surface, character and pattern recognition, etc., can solve problems such as large target, unsuitable for future application, poor handling of weak overlapping signals, etc.
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[0042] A detailed description of the body of the invention is provided below. While example embodiments are described, it should be understood that the present disclosure is not limited to any one embodiment, but rather covers numerous alternatives, modifications, and equivalents, as well as combinations of features from different embodiments.
[0043] Additionally, although numerous specific details are set forth in the following description in order to provide a thorough understanding of the invention in context, some embodiments may be practiced without some or all of these details. Also, for the purpose of clarity, certain technical material that is known in the related art has not been described in detail so as not to unnecessarily obscure the context of the present invention.
[0044] The scope of the patent application as described below is incorporated into the [Detailed Embodiments] and constitutes a part of the [Detailed Embodiments].
[0045] A general optical over...
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