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Laser-assisted glow discharge ionization device

A glow discharge and laser-assisted technology, which is applied in the field of mass spectrometry analysis and detection, can solve the problems of inability to achieve consistent ionization, low consistency, low detection accuracy, etc., to achieve suppression of matrix effects, high lateral spatial resolution, The effect of good analytical sensitivity

Inactive Publication Date: 2015-04-22
SOUTH CHINA NORMAL UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For the detection of semiconductor and non-conductive materials, DC glow discharge ionization needs to introduce a conductive matrix, and the detection accuracy is not high
At present, the uniformity of ionization of different elements in the commonly used glow discharge form is not high, and consistent ionization cannot be achieved, and the matrix effect is more obvious.

Method used

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  • Laser-assisted glow discharge ionization device
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Embodiment Construction

[0021] refer to figure 1 , figure 2, the present invention provides a laser-assisted glow discharge ionization device, including a laser light source 20, a mass spectrometer 37, a closed ionization chamber 19 and an ionization body located in the ionization chamber 19, the ionization body includes hollow copper The copper column holder 2 of the column 1 and the sample holder 7 equipped with the sample 5, the hollow copper column 1 is connected to the ground potential with the ionization chamber bottom plate 24 through a wire, and the sample 5 is introduced by the glow discharge voltage on the ionization chamber 19 The interface 27 is connected to the glow discharge power supply 26, and the voltage provided by the glow discharge power supply 26 is connected to the sample 5 through the glow discharge voltage introduction interface 27, and the copper column holder 2 and the sample holder 7 are arranged facing each other. The hollow copper column 1 is provided with a laser hole ...

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Abstract

The invention discloses a laser-assisted glow discharge ionization device which comprises a laser light source, a mass spectrometer, a closed ionization cavity and an ionization body. The ionization body comprises a copper column fixing base which contains a hollow copper column and a sample fixing base which contains a sample, the hollow copper column is connected to the ground potential through a wire and an ionization cavity bottom plate, and the sample is connected with a glow discharging power supply. The copper column fixing base and the sample fixing base are arranged oppositely, a laser hole is formed in the side, opposite to the sample, of the hollow copper column, and an ionization area is formed in the laser hole. Lasers emitted from the laser light source penetrate through the hollow copper column and then vertically radiate to the sample. A repeller plate which is used for feeding ions in the ionization area into the mass spectrometer is arranged on one side of the ionization area, and the repeller plate is connected with a DC high-voltage power supply. According to the laser-assisted glow discharge ionization device, glow discharge voltage signals and the ground potential are introduced through the structure, DC high voltages are introduced through the repeller plate to introduce ions generated by discharging into the mass spectrometer, the ion transmission efficiency is improved, and the detecting sensitivity is high.

Description

technical field [0001] The invention is used in the field of mass spectrometry analysis and detection, and in particular relates to a laser-assisted glow discharge ionization device. Background technique [0002] As an important optoelectronic material, high-purity materials are widely used in aerospace, microelectronics, information, infrared, solar energy and other industrial fields. For example: high-purity copper can be directly used as an additive element in the development of superalloys in aviation and space atom industries, and in the analysis of standard samples. It is the main material for preparing high-quality audio cables, liquid crystal display sputtering targets, and ion coatings. High-purity titanium is an important material for manufacturing aircraft, rockets, spacecraft, ships, telecommunications equipment and artificial bones. 6N (99.9999%) grade silicon is the main material for manufacturing solar cells, while the purity of semiconductor-grade polysilico...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J49/10H01J49/12
CPCH01J49/161
Inventor 郭长娟朱辉张景堂李艳张华科万家海黄正旭
Owner SOUTH CHINA NORMAL UNIVERSITY
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