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Mask plate, mask exposure apparatus and mask exposure method

A mask and mask technology, which is applied to microlithography exposure equipment, optomechanical equipment, photolithographic process exposure devices, etc. production costs, etc.

Inactive Publication Date: 2015-07-01
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The existing mask plate cannot realize the mask opening of the closed loop (Closed loop), such as figure 1 As shown, when it is necessary to obtain a closed-loop pattern, it is necessary to use multiple mask exposures, which greatly increases the production cost and reduces the production efficiency.
In order to realize the mask of this closed-loop opening, the prior art usually adds a bridge (Rib) on the mask plate (such as figure 2 However, the disadvantage of this mask is that the coating efficiency corresponding to the bridge part and the uniformity of film formation are not ideal, which seriously affects the overall quality of film formation on the substrate

Method used

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  • Mask plate, mask exposure apparatus and mask exposure method
  • Mask plate, mask exposure apparatus and mask exposure method
  • Mask plate, mask exposure apparatus and mask exposure method

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Embodiment Construction

[0023] In order to make the object, technical solution and advantages of the present invention clearer, the implementation manner of the present invention will be further described in detail below in conjunction with the accompanying drawings.

[0024] The mask plate 1 provided by the embodiment of the present invention, such as image 3 Shown, including Tray 2.

[0025] Wherein, the tray 2 has at least one mask positioning groove 3 , and a mask 4 is arranged in each mask positioning groove 3 .

[0026] In the mask plate provided by the embodiment of the present invention, the mask plate adopts a tray structure having at least one mask positioning groove, and a mask is arranged in each mask positioning groove. With such a structure of the mask plate, the mask is lifted by the positioning groove. For the mask with closed loop opening, the isolated mask part and the frame mask do not need to be connected by the bridge part, thus avoiding the bridge part. The efficiency and uni...

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Abstract

The invention discloses a mask plate, a mask exposure apparatus and a mask exposure method, belonging to the field of display technologies. The mask plate comprises a tray, wherein the tray is provided with at least one mask positioning slot, and a mask is arranged in each mask positioning slot. According to the mask plate, the mask exposure apparatus and the mask exposure method disclosed by the invention, closed-loop open-end mask can be effectively implemented, and the quality of film forming on substrates can be improved.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a mask plate, mask exposure equipment and a mask exposure method. Background technique [0002] In the process of manufacturing the display substrate, it is usually necessary to carry out multiple mask exposure processes. Each mask exposure usually requires a mask plate with a specific pattern. The existing mask plate is generally an open mask (Open Mask). Mask), including strip-shaped or groove-shaped mask openings. During the mask exposure process, light passes through the mask openings to irradiate the photoresist to realize the patterning of the photoresist. [0003] The existing mask plate cannot realize the mask opening of the closed loop (Closed loop), such as figure 1 As shown, when the closed-loop pattern needs to be obtained, multiple mask exposures are required, which greatly increases the production cost and reduces the production efficiency. In order to realize th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/64G03F1/66G03F7/20
CPCG03F1/64G03F7/20G03F1/50H01L27/1288G03F7/7035G03F1/38G03F1/76G03F7/70058
Inventor 藤野诚治张嵩王涛高静杜小波
Owner BOE TECH GRP CO LTD