Method for manufacturing solar cell with thin p-doped CdTe layer
A technology of solar cells and doped layers, applied in the direction of final product manufacturing, sustainable manufacturing/processing, circuits, etc., can solve problems such as limitations
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[0042] In the following, the method according to the invention is explained in a first exemplary embodiment showing the production of a solar cell in a layered structure, without any limitation being meant for said embodiment.
[0043] as in Figure 2a As shown in , the front contact (21) and the CdS layer (3) have been applied on the transparent substrate (1) by means of methods according to the prior art. As a front contact ( 21 ), a 450 nm thick transparent bilayer [fluorine-doped tin oxide (350 nm) as conductive layer and tin oxide (100 nm) as high-resistance buffer layer] was applied (as TCO). The CdS layer (3) reaches a thickness of 90nm and is deposited using the CSS technique. On it, a first CdTe layer ( 41 ) according to the invention is deposited with a thickness of 1.6 μm. The deposition process was carried out as a CSS process at a substrate temperature of 530°C, resulting in large grains of the deposited layer.
[0044] Figure 2b A sacrificial doped layer (5)...
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