A method for measuring the size of a quartz wafer
A technology of quartz wafer and measurement method, which is applied to measurement devices, instruments, optical devices, etc., can solve the problems of the actual size of the quartz wafer, the detection error of the size of the quartz wafer, and the poor imaging quality of the projection screen, so as to improve the imaging clarity. , improve edge detection, improve the effect of image contrast
Active Publication Date: 2018-08-24
RES INST OF ZHEJIANG UNIV TAIZHOU
View PDF5 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
However, the projection method has the following disadvantages: 1. The imaging quality of the projection screen is poor; 2. The light source used in the projection method is generally a halogen lamp, which will reflect thick objects into the lens and affect the actual size of the quartz wafer.
Therefore, this method has large errors in the size detection of the quartz wafer, and the accuracy cannot meet the requirements, especially small defects such as rough surfaces and burrs on the quartz wafer will have a great impact on the detection accuracy
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0033] The following are specific embodiments of the present invention, and further describe the technical solution of the present invention in conjunction with the accompanying drawings, but the present invention is not limited to these embodiments.
[0034] Such as figure 2 As shown, the method for measuring the dimension of the quartz wafer involves the following measuring devices: light source 1 , polarizer P1 , analyzer P2 , camera 2 and processor 4 . Wherein the light source 1 is used to provide illumination during the detection process. In order to provide a better light source 1, a parallel surface light source is used in this embodiment, which can avoid reflecting the thick quartz wafer 3 into the camera lens of the camera 2 and improve the camera performance. 2 imaging quality; camera 2 is used to collect the image of quartz wafer 3, so this camera 2 adopts the industrial camera with high photographing sensitivity, low image noise, and higher image resolution; polar...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
The present invention provides a measurement method for size of a quartz wafer, belonging to the field of measuring technique of the quartz wafer and solving the problem of measurement of a quartz wafer with poor precision in the prior art. The measurement method for size of the quartz wafer relates to the following measurement devices: a light source, a polarizer, an analyzer, a camera and a processor. The measurement method comprises the following steps: adjusting positions of the measurement devices and putting samples; adjusting the polarizer, the analyzer and the angles between the quartz wafer and the polarizer and between the quartz wafer and the analyzer; shooting images and sending images to the processor; and calculating the size of the quartz wafer. The measurement method is simple in measurement process and easy to operate, and is capable of greatly improving measurement accuracy of the size of the quartz wafer.
Description
technical field [0001] The invention relates to the technical field of quartz wafer measurement, in particular to a method for measuring the size of a quartz wafer. Background technique [0002] Quartz wafers are widely used in electronic devices and are currently the most used crystalline material in the world. Its products mainly include quartz crystal resonators and quartz crystal oscillators, which have good frequency stability and are mainly used in communications, computers, navigation, aerospace, household appliances and other fields. During the production and processing of quartz wafers, it is inevitable that some of the quartz wafers will have some appearance defects after cutting, grinding and other processes. These defects seriously affect the performance of the quartz wafers, so it is necessary to sort the produced quartz wafers. , to separate the quartz wafers with problems in appearance quality. At present, the production process mainly relies on manual labor...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/00
Inventor 陈浙泊华晓锋林斌
Owner RES INST OF ZHEJIANG UNIV TAIZHOU