PVD processing device and PVD processing method

Abstract

The present invention provides a PVD processing apparatus (1) and method capable of forming a composite film having a film thickness excellent in uniformity in the circumferential direction on the outer peripheral surface of a base material through the rotation and revolution of the base material. The PVD processing device (1) has: a vacuum chamber; a revolution table for making multiple substrates (W) revolve around a revolution axis (7) in the vacuum chamber; The rotation axis (8) of the rotation axis (7) is an autorotation table (4); a variety of targets (5) are arranged at positions separated from each other in the circumferential direction on the radially outer side of the revolution table; on the substrate (W) During the period between two tangents (L1, L2) drawn from the center of each target (5) to an arc enveloping each turntable (4), the turntable (4) is rotated at an angle of more than 180° Table rotation mechanism (6).

Description

technical field [0001] The invention relates to a PVD treatment device and a PVD treatment method. Background technique [0002] In order to improve the wear resistance of cutting tools and improve the sliding contact characteristics of the sliding contact surface of mechanical parts, the base material (film formation object) of cutting tools and mechanical parts is treated by physical vapor deposition (PVD) method. The film formation, specifically, the formation of a film such as TiN, TiAlN, CrN, etc. is performed. PVD processing devices such as arc ion plating (AIP) devices and sputtering devices are known as devices used for such film formation. [0003] As such a PVD treatment apparatus, an apparatus that combines a plurality of PVD methods to form a composite film is known. For example, an apparatus is known in which a hard film is formed on the surface of a substrate (work) by arc ion plating, and then a lubricating film is formed on the hard film by a sputtering dev...

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Problems solved by technology

[0008] However, even when the base material is rotated and revolved using an apparatus having the above-mentioned autorotation and revolution function, if the rotation ratio (gear ratio) of the autorotation table relative to the revolution table is not set to an appropriate value, there may be The problem of not being able to obtain a homogeneous composite film

For example, when the rotation ratio between the revolution table and the rotation table is set to an appropriate value, a composite film with a cross-sectional shape in which annular films are concentrically stacked can be obtained. However, if the rotation of the revolution table and the rotation table If the ratio is not set to an appropriate value, a composite film with an inhomogeneous structure may be formed

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