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Cavity automatic cleaning device

An automatic cleaning and cavity technology, applied in the direction of cleaning hollow objects, cleaning methods and utensils, chemical instruments and methods, etc., can solve problems such as difficult cleaning, affecting the service life of equipment, affecting the effect of wet process, etc., to reduce maintenance costs , the effect of improving work efficiency

Inactive Publication Date: 2015-12-09
ACM RES SHANGHAI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The wet process chamber used in the semiconductor wet process will produce a large amount of residue during the process, and these residues will adhere to the inner wall of the chamber and are difficult to clean
There is currently no effective cleaning equipment to remove residues attached to the inner wall of the wet process chamber
And if the residue is not effectively cleaned, it will affect the effect of the wet process and the service life of the equipment

Method used

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  • Cavity automatic cleaning device
  • Cavity automatic cleaning device
  • Cavity automatic cleaning device

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Embodiment Construction

[0019] In order to describe the technical content, structural features, goals and effects of the present invention in detail, the following will be described in detail in conjunction with the embodiments and drawings.

[0020] figure 1 The three-dimensional structure of a preferred embodiment of the automatic cavity cleaning device of the present invention is shown, figure 2 shows its top view, image 3 Its bottom view is shown. Please also see Figure 1 to Figure 3 , the automatic chamber cleaning device of this embodiment is installed on the wet process chamber of semiconductor manufacturing, and the device includes a casing and a shower head 3, wherein the casing has a top plate 1 and a side wall 2. In this embodiment, there are 4 spray heads, which are fixed on the lower bottom surface of the top plate 1 of the casing, and are located on the four corners, aiming at the cavity to spray cleaning liquid such as deionized water.

[0021] Preferably, there is also a fan on...

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Abstract

The invention discloses a cavity automatic cleaning device. A cavity obtained through a wet process is cleaned, and residues on the inner wall of the cavity are removed. According to the technical scheme, the cavity automatic cleaning device comprises an outer shell and a shower nozzle, wherein the outer shell is provided with a top plate and a lateral wall; and the shower nozzle is fixed to the lower bottom face of the top plate of the outer shell and aligns at the interior of the cavity to spray out washing liquid.

Description

technical field [0001] The invention relates to an automatic cleaning chamber device, in particular to an automatic cleaning device suitable for wet process chambers. Background technique [0002] The wet process chamber used in the semiconductor wet process will generate a large amount of residues during the process, and these residues will adhere to the inner wall of the chamber and are difficult to clean. At present, there is no effective cleaning equipment to remove the residue attached to the inner wall of the wet process chamber. If the residues are not cleaned effectively, it will affect the effect of the wet process and the service life of the equipment. Contents of the invention [0003] The object of the present invention is to solve the above problems, and provides an automatic cavity cleaning device, which cleans the wet process cavity and removes residues on the inner wall of the cavity. [0004] The technical solution of the present invention is: the presen...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B9/093
Inventor 张镇磊金一诺张怀东王坚王晖
Owner ACM RES SHANGHAI