Field cut-off current control type power device with self-adaption
A technology for current control and power devices, applied in electrical components, semiconductor devices, circuits, etc., can solve the problem of no field cut-off function, and achieve the effect of getting rid of limited diffusion depth and enhancing adaptive characteristics
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Embodiment 1
[0031] The self-adaptive field cut-off current control type power device includes a metal conductive layer 101, and one side of the metal conductive layer 101 is provided with a substrate or a substrate epitaxial layer 100, where the substrate or substrate epitaxial layer 100 is two In an alternative relationship, according to the structure of the device and the corresponding process, it can be the substrate or the epitaxial layer of the substrate. The substrate refers to the directly purchased substrate substrate, such as single crystal silicon, and the substrate epitaxial layer refers to a layer of single crystal thin film grown by epitaxy on the purchased substrate substrate. Take PNPN type GTO as an example, such as figure 1 , use an N-type substrate, form a P base region and an N emitter, that is, a cathode, by diffusion on the front side, and form a P emitter, that is, an anode, by diffusion on the back side. At this time, the label 100 is actually the substrate. Take t...
Embodiment 2
[0034] The self-adaptive field cut-off current control type power device includes a metal conductive layer 101, and one side of the metal conductive layer 101 is provided with a substrate or a substrate epitaxial layer 100, where the substrate or substrate epitaxial layer 100 is two In an alternative relationship, according to the structure of the device and the corresponding process, it can be the substrate or the epitaxial layer of the substrate. The substrate refers to the directly purchased substrate substrate, such as single crystal silicon, and the substrate epitaxial layer refers to a layer of single crystal thin film grown by epitaxy on the purchased substrate substrate. Take PNPN type GTO as an example, such as figure 1 , use an N-type substrate, form a P base region and an N emitter, that is, a cathode, by diffusion on the front side, and form a P emitter, that is, an anode, by diffusion on the back side. At this time, the label 100 is actually the substrate. Take t...
Embodiment 3
[0042] The self-adaptive field cut-off current control type power device includes a metal conductive layer 101, and one side of the metal conductive layer 101 is provided with a substrate or a substrate epitaxial layer 100, where the substrate or substrate epitaxial layer 100 is two In an alternative relationship, according to the structure of the device and the corresponding process, it can be the substrate or the epitaxial layer of the substrate. The substrate refers to the directly purchased substrate substrate, such as single crystal silicon, and the substrate epitaxial layer refers to a layer of single crystal thin film grown by epitaxy on the purchased substrate substrate. Take PNPN type GTO as an example, such as figure 1 , use an N-type substrate, form a P base region and an N emitter, that is, a cathode, by diffusion on the front side, and form a P emitter, that is, an anode, by diffusion on the back side. At this time, the label 100 is actually the substrate. Take t...
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