A photoelectric detection device, method and photoresist coating equipment
A photoelectric detection and equipment technology, applied in measuring devices, photo-engraving process coating equipment, material analysis by optical means, etc., can solve the problems of inaccurate judgment, time-consuming and laborious shellmura detection, etc., and achieve the effect of solving inaccurate judgment.
Inactive Publication Date: 2020-01-03
BOE TECH GRP CO LTD +1
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Problems solved by technology
[0004] Embodiments of the present invention provide a shell mura detection device, method, and photoresist coating equipment, which are used to solve the problems of time-consuming and labor-intensive detection of shell mura and prone to inaccurate judgments
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[0055]The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0056] It should be noted that, in order to clearly describe the technical solutions of the embodiments of the present invention, in the embodiments of the present invention, words such as "first" and "second" are used for the same or similar items with basically the same function and effect To make a distinction, those skilled in the art can understand that words such as "first" and "second" do not limit the quantity and execution order.
[0057] An embodiment...
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The invention provides a photoelectric detection device and a method thereof as well as photoresist coating equipment, relates to the technical field of production of displayers and aims to solve the problems that time consumptionand labor consumptionare high and judgment inaccuracy is easy to cause during detecting shell mura. The photoelectric detection device comprises a light source and a receiving processor, wherein the light source is used for generating detectionlight beams and projecting the detectionlight beams to a transparent substrate; the receiving processor is fixed opposite to the light source, located behind the light source and used for receiving first reflection light generated by a reflection detection light beam on the upper surface of the transparent substrate and second reflection light generated by a reflection detection light beam on the lower surface of the transparent substrate and obtaining measurement light path difference; the measurement light path difference is difference between a light path of the first reflection light and a light path of the second reflection light; the receiving processor is also used for judging whether the light path difference meets a preset condition and determining that water ripples are formed in the transparent substrate when the measurement light path difference cannot meet the preset condition. The photoelectric detection device is applied to detection of shell mura.
Description
technical field [0001] The invention relates to the technical field of display manufacturing, in particular to a photoelectric detection device, method and photoresist coating equipment. Background technique [0002] Photoresist coating is a crucial process in the photolithography process of thin film transistors (full name in English: Thin Film Transistor, TFT for short). At present, the slit coating (English name: Slit Coating) method is generally used for photoresist coating in the TFT photolithography process. [0003] Slit coating generally includes steps such as substrate cleaning, photoresist coating, decompression drying, and heating and baking. In the photoresist coating process, the transparent substrate is still, and the coating is carried out by means of a doctor blade with a slit. The doctor blade with a slit controls the uniformity of the photoresist film layer by controlling the distance from the surface of the substrate. Although the substrate is cleaned an...
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IPC IPC(8): G01N21/17G03F7/16
CPCG01N21/17G03F7/16
Inventor 齐发徐海涛刘超钱娟娟彭亮亮欧阳欠江涛
Owner BOE TECH GRP CO LTD