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A device and method for realizing the positioning of a moving platform

A motion table and reflection module technology, applied in the field of integrated circuit equipment manufacturing, can solve the problems of low capture accuracy, increase the cost of the whole machine, etc., and achieve the effect of high capture repeatability

Active Publication Date: 2020-11-13
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] In the prior art, the zeroing of most lithography machine moving tables is realized through the basic frame measurement system of the moving table itself, which is equivalent to the zero position of the moving table being fixed on the basic frame (marble, etc.), and this technical solution cannot be directly Let the motion stage and the main substrate establish a direct connection, and the capture accuracy is not high. In addition, in the front-end lithography machine, the zero-return sensor fixed on the main substrate is often used to reset the motion stage. This solution requires at least 3 A zeroing sensor will increase the cost of the whole machine to a certain extent

Method used

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  • A device and method for realizing the positioning of a moving platform
  • A device and method for realizing the positioning of a moving platform
  • A device and method for realizing the positioning of a moving platform

Examples

Experimental program
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Effect test

Embodiment 1

[0041] The device for realizing the positioning of the moving platform provided by the present invention includes an illumination light source, an image sensor 10 , a reference plate 20 , a corner prism 30 and a reflector 40 . Such as figure 1 As shown, the image sensor 10 is fixed under the main substrate 1 of the lithography apparatus, and its optical axis direction is vertically downward. In this embodiment, the image sensor 10 is a CCD or CMOS; Overlapping light beams; the reference plate 20 is fixed under the main substrate 1, the reference plate 20 is a transparent plate, and a measurement mark 201 is arranged, and the present embodiment selects a square mark, such as figure 2 As shown; the light beam provided by the illumination source illuminates the measurement mark 201 to form a measurement mark image; the corner prism 30 is fixed on the reference plate 20, and is arranged behind the measurement mark 201 to reflect the measurement mark image; the reflector 40 is a p...

Embodiment 2

[0044] The motion table 50 has six degrees of freedom. In order to position the six degrees of freedom (translation, vertical, rotation, and tilt) of the motion table 50, it is necessary to set a plurality of measurement marks 201 on the reference plate 20, correspondingly on the motion table 50. To set up multiple mirrors.

[0045] Such as image 3 In the example shown, the difference between this embodiment and Embodiment 1 is that three measurement marks 201 are set on the reference plate, respectively distributed in the first, third, and fourth quadrants, and correspondingly, they are also arranged on the motion table 50 Three reflection mirrors 40, three reflection mirrors 40 are respectively arranged in the first, third and fourth quadrants of the moving platform 50, as Figure 4 shown.

[0046]The information of the measurement marker image measured by the image sensor 10 has two degrees of freedom, and when the motion platform 50 degrees of freedom moves, it will aff...

Embodiment 3

[0048] Different from Embodiment 2, in this embodiment, all three mirrors 40 are arranged in the first quadrant to reduce the movement time of the moving platform 50 in the positioning process, specifically as Figure 5 As shown, here the reflector 40 is a plane mirror installed on the moving platform 50 at an inclination angle of 60°, and the normal vectors of the three plane mirrors are respectively [1, 1, sqrt (6)], [-1, -1, sqrt (6)], [1,-1, sqrt(6)].

[0049] The following is a method for realizing the positioning of the moving platform provided by the present invention.

[0050] For aligning a single measurement mark 201, there is the following conversion relationship:

[0051]

[0052] in:

[0053] xi, yi: measure the measured value of the two-dimensional position information of the marker image for the image sensor;

[0054] xi0, yi0: measure the measured value of the marker image during calibration;

[0055] Gij: the conversion matrix from the degree of freedom...

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Abstract

The invention discloses a device and method for achieving positioning of a motion table. The device comprises a reference plate, a lighting light source, an image sensor, a reflection unit and a control unit, wherein a measurement mark is arranged on the reference plate, the lighting light source is used for illuminating the measurement mark, the image sensor is used for obtaining imaging information of the measurement mark, the reflection unit is used for reflecting light for illuminating the measurement mark to the motion table and then reflecting the light to the image sensor after the light passes through the motion table, and the control unit is used for processing the imaging information of the measurement mark to obtain position information of the motion table so as to position the motion table. Compared with the prior art, the device has the characteristics of simple structure, high capturing accuracy and the like.

Description

technical field [0001] The invention relates to the field of integrated circuit equipment manufacturing, in particular to a device and method for realizing the positioning of a moving platform through an image sensor. Background technique [0002] In the prior art, the zeroing of most lithography machine moving tables is realized through the basic frame measurement system of the moving table itself, which is equivalent to the zero position of the moving table being fixed on the basic frame (marble, etc.), and this technical solution cannot be directly Let the motion stage and the main substrate establish a direct connection, and the capture accuracy is not high. In addition, in the front-end lithography machine, the zero-return sensor fixed on the main substrate is often used to reset the motion stage. This solution requires at least 3 A reset sensor will increase the cost of the whole machine to a certain extent. Contents of the invention [0003] In order to overcome th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 沈鑫
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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