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Continuous rotation mechanism for placing membrane switch shrapnel

A technology of membrane switch and rotary mechanism, which is applied to electric switches, electrical components, circuits, etc., can solve the problems of low production efficiency, slow speed, and time-consuming, and achieve the effects of simple structure, convenient use, and improved accuracy

Active Publication Date: 2018-08-14
滕州方冠企业管理咨询有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Among them, many companies still use manual placement in the process of assembly (cutting of inter-pieces, releasing shrapnel), which is laborious, time-consuming, low in production efficiency, prone to defective products, and elastic fatigue often occurs after use; some companies use fixed-point The shrapnel is placed by grabbing the shrapnel, and the speed cannot be further improved due to the long path
[0005] In response to this phenomenon, a mechanism for placing membrane switch shrapnel was developed to solve the shortcomings of low production efficiency of manual placement, and at the same time solve the problem of long walking path and slow speed of fixed-point grabbing shrapnel equipment

Method used

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  • Continuous rotation mechanism for placing membrane switch shrapnel
  • Continuous rotation mechanism for placing membrane switch shrapnel
  • Continuous rotation mechanism for placing membrane switch shrapnel

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] Such as figure 1 , figure 2 , image 3 As shown, the continuous rotation mechanism for placing the shrapnel of the membrane switch includes a container 1 for placing the shrapnel, a shrapnel pressure device 2 located on the side wall of the container 1 for placing the shrapnel, a shrapnel quantity detection device 3 located at the front end of the shrapnel pressure device 2, and a rotating The blanking mechanism 4, the rotary blanking mechanism 4 is arranged on the front end of the container 1 where the shrapnel is placed, the rotary blanking mechanism 4 includes the first disc 5, the first boss 6, the second disc 7, the first shift fork 8, the second Three discs 9 and a fourth disc 10 are used to lock the first shell 11 of the first disc 5 and are used to lock the second shell 12 of the first shift fork 8. The first disc 5 is provided with a second shell 12. A through hole 5a, the first boss 6 is provided with a second through hole 6a, the first boss 6 includes a ch...

Embodiment 2

[0042] Such as figure 1 , figure 2 , image 3 , Figure 4 As shown, the continuous rotation mechanism for placing the shrapnel of the membrane switch includes a container 1 for placing the shrapnel, a shrapnel pressure device 2 located on the side wall of the container 1 for placing the shrapnel, a shrapnel quantity detection device 3 located at the front end of the shrapnel pressure device 2, and a rotating The blanking mechanism 4, the rotary blanking mechanism 4 is arranged on the front end of the container 1 where the shrapnel is placed, the rotary blanking mechanism 4 includes the first disc 5, the first boss 6, the second disc 7, the first shift fork 8, the second Three discs 9 and a fourth disc 10 are used to lock the first shell 11 of the first disc 5 and are used to lock the second shell 12 of the first shift fork 8. The first disc 5 is provided with a second shell 12. A through hole 5a, the first boss 6 is provided with a second through hole 6a, the first boss 6 ...

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PUM

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Abstract

The invention discloses a continuous rotating mechanism for placing a thin-film switch shrapnel, and relates to basic electrical elements. According to the technical scheme, the shortcoming that artificial placing is low in production efficiency is solved, and meanwhile the problem that the walking path is long and the speed is low for a fixed-point shrapnel grabbing device is solved. The continuous rotating mechanism comprises a container for placing shrapnels, a shrapnel pressure device which is located at the side wall of the container for placing the shrapnels, and a shrapnel number detecting device which is located at the front end of the shrapnel pressure device, and the continuous rotating mechanism further comprises a rotation discharging mechanism, wherein the rotation discharging mechanism is arranged at the front end of the container for placing the shrapnels. The continuous rotating mechanism for placing the thin-film switch shrapnel has the advantages that firstly, the mechanism has an initial velocity and can quickly shoot the shrapnels to the surface in which the shrapnels need to be placed; secondly, the mechanism adjusts angles and uses a first shifting fork to swing the thin-film switch shrapnel to a specific angle; thirdly, the mechanism automatically alarms, and shrapnel number detecting device outputs a prompting signal to a control system.

Description

technical field [0001] The invention relates to basic electric components, in particular, it is a continuous rotating mechanism for placing elastic pieces of membrane switches. Background technique [0002] Membrane switches are widely used in electronic products. Membrane switch shrapnel is one of the most important components, and its quality even affects the performance of electronic products using it. [0003] The process of placing shrapnel in the membrane switch industry is generally material feed inspection "cutting" shrinkage "printing" PQC (semi-finished product inspection) "assembly (inter-piece punching, shrapnel release)" punching "test" finished product assembly "finished product punching" Assembled sets "test" FQC (final inspection) "OQC (outgoing inspection)" storage. [0004] Among them, many companies still use manual placement in the process of assembly (cutting of inter-pieces, releasing shrapnel), which is laborious, time-consuming, low in production eff...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01H11/00
CPCH01H11/00
Inventor 尹志强
Owner 滕州方冠企业管理咨询有限公司