A method and device for rapidly preparing graphene patterns with double beams

Abstract

The invention discloses a method and device for quickly preparing graphene patterns through double beams. The method comprises the steps that continuous laser beams and short-pulse laser beams are focused to the surface of a nickel substrate at the same time, a beam focusing region on the surface of the nickel substrate is quickly heated to the graphene growth temperature by the short-pulse beams within the laser pulse width time, the gathered continuous laser beams are heated continuously so that the temperature of the region can be stably kept at the graphene growth temperature, and the graphene synthesis is conducted; and the device is provided with a pulse laser unit, a continuous laser unit, a dichroscope, a beam shaping and focusing unit, a vacuum chamber, a gas flow control unit and a three-axis precision translation platform, and quick preparation of any graphene pattern can be achieved. According to the method and device, preparation of the graphene patterns can be completed by using the small laser power density, and the cost of the device is lowered effectively; and due to the fact that the pulse laser heating speed is high, the heat-affected zone is small, the edge quality of the prepared graphene patterns is improved effectively, and the preparation speed of the prepared graphene patterns is increased effectively.

Description

technical field [0001] The invention relates to the technical field of graphene preparation, in particular to a method and device for rapidly preparing graphene graphics with double beams. Background technique [0002] Graphene is a carbon atom with sp 2 A two-dimensional material with a honeycomb structure formed by hybridization, with a thickness of only 0.335nm. Graphene has excellent optical, electrical, mechanical and physical properties. It is currently the thinnest but hardest nanomaterial. Its electronic energy band, physical and chemical properties are easy to adjust. Nanosensors, energy, machinery and other fields have good application prospects, and are the core materials of the next generation of micro-nano-opto-electromechanical devices. The so-called graphene pattern (Graphene Patterns) is a graphene structure with specific functions obtained after the complete graphene film is patterned. The patterning of graphene is the key to realizing the function of gra...

AI Technical Summary

Problems solved by technology

Using a single CW laser to heat the substrate has the following two disadvantages: First, the CW laser beam requires a large laser power density to heat the substrate to the graphene growth temperature (950°C)

High-power CW lasers are very expensive, and a small focused CW laser beam can only synthesize graphene patterns with small linewidths, which limits the application of this technology

Secondly, the continuous heating of the nickel substrate by the continuous laser beam with high power density will easily lead to a large heat-affected zone on the nickel substrate, which will affect the edge quality of the graphene pattern.

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