Kinematic supports for optical components, projection objectives and lithography machines
A technology of optical components and supporting devices, which is applied in the direction of exposure devices, optics, and optomechanical equipment in photolithography, can solve problems such as difficult to meet the requirements of surface shape accuracy, and achieve the effect of improving surface shape accuracy
Active Publication Date: 2019-04-02
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
View PDF9 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
The traditional support methods such as flanged mirror base installation, snap ring installation, and pressure ring installation have been difficult to meet the requirements of high-precision lithography projection objective lenses for the surface shape accuracy of optical components
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0023] In order to enable those skilled in the art to better understand the solutions of the present invention, the following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only It is an embodiment of a part of the present invention, but not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.
[0024] The terms "first", "second", "third", "fourth", etc. (if any) in the description and claims of the present invention and the above drawings are used to distinguish similar objects, and not necessarily Used to describe a specific sequence or sequence. It is to be understood that the terms so used are interchangeable under appropriat...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
The present invention provides a kinematics supporting device for optical elements, comprising: a mirror frame, three sets of supporting legs, respectively installed on the mirror frame along the circumferential direction of the mirror frame, and each group of supporting legs constrains the displacement of two degrees of freedom; wherein , the optical element is fixed in the support foot, and the support foot constrains the optical element, which can realize six degrees of freedom and precise constraint at the same time. It is especially suitable for stress-free support of optical elements with high surface shape accuracy, and can meet the requirements of photolithography. The requirement of high-precision support surface shape when the environment of the objective lens fluctuates effectively improves the precision of the support surface shape of the optical element. Correspondingly, the present invention provides a projection objective lens and a photolithography machine provided with the above-mentioned optical element kinematic support device.
Description
technical field [0001] The invention relates to the technical field of photolithographic projection objective lenses, in particular to a kinematic support device for optical elements, a projection objective lens and a photolithography machine. Background technique [0002] With the continuous improvement of semiconductor industry's requirements for the resolution of 193nm lithography projection objective lens, the reduction of characteristic line width of integrated circuit requires projection objective lens to have higher numerical aperture and smaller system wave aberration. [0003] The optical system is more sensitive to the machining accuracy of the support structure, assembly tolerance, external stress and environmental changes. The support structure of the optical components in the lithography projection objective should not only meet the requirements of positioning accuracy, but also be able to compensate for the adverse effects of external stress, vibration and temp...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70275G03F7/70716
Inventor 张德福倪明阳李显凌隋永新杨怀江
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI