Exposure device and exposure method thereof

Abstract

The invention discloses an exposure device and an exposure method thereof. A manner of horizontally moving a transparent body in an exposure area between a mask plate and a machine table used for holding a substrate to be exposed is used for replacing the existing exposing manner of moving the substrate to be exposed up and down. Specifically, the transparent body has a structure capable of enabling light path change of each exposure position in the exposure area to be greater than 2p<2> / lambda when an exposure light source carries out exposure operation; p is a space between periodic patterns in the mask plate; lambda is set wavelength emitted by the exposure light source. Through horizontal movement of the transparent body, the longitudinal light path of each exposure position in the exposure area is changed; the longitudinal light path change caused by the easily controllable horizontal movement is used for replacing optical distance change caused by slight movement of the substrate to be exposed; the problem of alignment accuracy generated by the substrate to be exposed in the moving process can be avoided under the condition that the conditions required by exposure are met.

Description

technical field [0001] The invention relates to the technical field of display manufacturing, in particular to an exposure device and an exposure method thereof. Background technique [0002] The current flat panel display products, whether it is liquid crystal panel (LCD) or organic electroluminescent display panel (OLED), have higher and higher requirements for exposure equipment, from the original pattern production with a resolution of about 5 μm to the present It is difficult for the current mainstream large-scale exposure equipment to break through the limit of resolution of 1 μm. [0003] For this reason, in order to produce graphics with a resolution exceeding 1 μm, exposure equipment based on the Taber effect came into being. The Talbot effect is a very important optical phenomenon. Simply put, it means that an object can be imaged through a periodic medium under certain conditions, and the image is generally periodic. When a monochromatic plane wave irradiates a ...

AI Technical Summary

Problems solved by technology

[0005] In view of this, an embodiment of the present invention provides an exposure device and its exposure method to solve the existing problem of alignment accuracy of the substrate to be exposed during the moving process

Images