A kind of exposure equipment and exposure method thereof

Abstract

The invention discloses an exposure device and an exposure method thereof, in which a transparent body is moved horizontally in the exposure area between a mask plate and a machine for placing a substrate to be exposed, instead of moving the exposed substrate up and down in the prior art way of exposure. Specifically, the transparent body has the characteristics that the optical path change of each exposure position in the exposure area is greater than 2p when the exposure light source is exposed. 2 The structure of / λ; p is the interval between periodic patterns in the mask; λ is the set wavelength emitted by the exposure light source. Through the horizontal movement of the transparent body, the longitudinal optical path of each exposure position in the exposure area is changed, and the longitudinal optical path change brought about by the relatively controllable horizontal movement is used instead of the optical distance change brought about by the slight movement of the substrate to be exposed. Under the condition that the conditions required for exposure are met, the problem of alignment accuracy generated during the moving process of the substrate to be exposed can be avoided.

Description

technical field [0001] The invention relates to the technical field of display manufacturing, in particular to an exposure device and an exposure method thereof. Background technique [0002] The current flat panel display products, whether it is liquid crystal panel (LCD) or organic electroluminescent display panel (OLED), have higher and higher requirements for exposure equipment, from the original pattern production with a resolution of about 5 μm to the present It is difficult for the current mainstream large-scale exposure equipment to break through the limit of resolution of 1 μm. [0003] For this reason, in order to produce graphics with a resolution exceeding 1 μm, exposure equipment based on the Taber effect came into being. The Talbot effect is a very important optical phenomenon. Simply put, it means that an object can be imaged through a periodic medium under certain conditions, and the image is generally periodic. When a monochromatic plane wave irradiates a ...

AI Technical Summary

Problems solved by technology

[0005] In view of this, an embodiment of the present invention provides an exposure device and its exposure method to solve the existing problem of alignment accuracy of the substrate to be exposed during the moving process

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