Nozzle cleaning device and coating machine

Abstract

The invention provides a nozzle cleaning device which is used for cleaning a spraying device and comprises two limiting discs, a doctor blade, a bracket, a first driving part and a guide rail, whereinthe bracket is mounted on the guide rail in a sliding manner; the two limiting discs are arranged on the bracket oppositely; a slit area is formed between the two limiting discs; the doctor blade ispositioned in the slit area; the disc surfaces of the two limiting discs are propped against the surface of the doctor blade; the periphery of the doctor blade directly faces a nozzle; the first driving part is positioned on the bracket and is connected with the two limiting discs; and the first driving part is used for driving the limiting discs to rotate to enable the doctor blade to scrape andwipe the nozzle. The nozzle cleaning device can scrape the nozzle in real time during production to effectively prevent light resistance in the nozzle from condensation and reduce the film breaking phenomenon. The invention further provides a coating machine which comprises the nozzle cleaning device, the nozzle and a bearing platform, wherein the nozzle cleaning device is positioned below the nozzle.

Description

technical field [0001] The invention relates to the technical field of display screen manufacturing, in particular to a nozzle cleaning device and a coating machine. Background technique [0002] In the TFT-LCD process, photoresist coating is a very important process in the yellow light process. The current photoresist coating mostly adopts a slit coater with fast coating speed, high precision and uniform film thickness. However, in the production process, when coating for a long time or when the photoresist line is stopped, opened and changed, due to the condensation of the photoresist in the nozzle of the slit coater, it is very easy to cause the coating to break and produce a photoresist film layer. uneven phenomenon. In order to improve the above problems, it is often necessary to manually scrape the nozzle on the slit coater, which not only reduces the production efficiency, but also causes a lot of labor cost waste. Contents of the invention [0003] The object of...

AI Technical Summary

Problems solved by technology

However, in the production process, due to the condensation of the photoresist in the nozzle of the slit coater when coating for a long time or when the photoresist line is stopped, opened and changed, it is very easy to cause the coating film to break and produce a photoresist film layer. Inhomogeneity

In order to improve the above problems, it is often necessary to manually scrape the nozzle on the slit coater, which not only reduces the production efficiency, but also causes a lot of labor cost waste

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