Device and method for thermal machining
A processing area and aspect technology, applied in the field of devices and methods for thermal processing, can solve problems such as insufficient adjustment
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[0081] figure 1 The radiation source 5 is shown in a schematic side view, which emits a laser beam 6 onto a processing area 1 which is located on the surface 2 of the workpiece. In the exemplary embodiment shown, when the laser beam 6 leaves the radiation source 5, the laser beam 6 is already focused on the workpiece surface 2; that is, it does not require any other arrangement in the beam path outside the radiation source 5 Optical element. For the purpose of setting the intensity of the laser beam 6, an optical filter 12 that is adjustable in terms of filtering effect is located in the beam path of the laser beam as an intensity reduction element. However, in other exemplary embodiments, instead of or in addition to the optical filter 12, a polarizer, a pair of polarizers (in each case, with a different polarization axis), a diaphragm, a general The beam trap of the laser beam 6 is partially shielded, or the shutter is preferably rotated. The device shown can be used to se...
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