InGaAs detector chip and preparation method thereof

A detector chip and absorbing layer technology, which is applied in the field of InGaAs detector chip and its preparation, can solve the problems of reduced chip life, chip failure, and normal use of customers, so as to improve antistatic ability, increase junction capacitance, and ensure reliability effect

Active Publication Date: 2019-04-26
SUZHOU SUNA PHOTOELECTRIC
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  • Abstract
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  • Claims
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Problems solved by technology

[0003] However, in the fields of lasers, detectors and other chips, electrostatic breakdown often leads to the failure of the chip during use, resulting in a reduction in the life of the chip, affecting the normal use of customers, and the antistatic ability and reliability of the chip cannot be guaranteed.

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  • InGaAs detector chip and preparation method thereof
  • InGaAs detector chip and preparation method thereof
  • InGaAs detector chip and preparation method thereof

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[0030] ginseng figure 2 As shown, the present invention also discloses a method for preparing an InGaAs detector chip, comprising:

[0031] providing a substrate;

[0032] epitaxially growing an N-type semiconductor layer on the substrate, the N-type semiconductor layer being an n+ doped InP layer;

[0033] The absorber layer is epitaxially grown on the N-type semiconductor layer. The absorber layer includes a p+ doped P-type InGaAs absorber layer and an n+ doped N-type InGaAs absorber layer. The P-type InGaAs absorber layer is located above the N-type InGaAs absorber layer, and the P-type InGaAs The thickness of the absorbing layer is smaller than the thickness of the N-type InGaAs absorbing layer, and the doping concentration of the P-type InGaAs absorbing layer is greater than that of the N-type InGaAs absorbing layer;

[0034] A P-type semiconductor layer is epitaxially grown on the absorption layer, and the P-type semiconductor layer is a p+ doped InP layer.

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Abstract

The invention discloses an InGaAs detector chip and a preparation method thereof. The InGaAs detector chip sequentially comprises a substrate, an N-type semiconductor layer, an absorption layer and aP-type semiconductor layer. The N-type semiconductor layer is an n+ doped InP layer, the P-type semiconductor layer is a p+ doped InP layer, the absorption layer comprises a p+ doped P-type InGaAs absorption layer and an n+ doped N-type InGaAs absorption layer, and the P-type InGaAs absorption layer is adjacent to the P-type semiconductor layer. The N-type InGaAs absorption layer is adjacent to the N-type semiconductor layer, the thickness of the P-type InGaAs absorption layer is smaller than that of the N-type InGaAs absorption layer, and the doping concentration of the P-type InGaAs absorption layer is greater than that of the N-type InGaAs absorption layer. By optimizing the thicknesses and doping of the absorption layers, the high-low doped two-layer InGaAs absorption layers is adopted, the junction capacitance of a PN junction can be increased, the anti-static capability of the detector chip is greatly improved, and the reliability of the chip is ensured.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to an InGaAs detector chip and a preparation method thereof. Background technique [0002] The traditional structure of InGaAs detector chip is InP / InGaAs / InP structure, which has good performance in the near-infrared band, which makes it widely used in civil, military and aerospace fields. [0003] However, in the fields of lasers, detectors and other chips, electrostatic breakdown often leads to the failure of the chip during use, resulting in a reduction in the life of the chip, affecting the normal use of customers, and the antistatic ability and reliability of the chip cannot be guaranteed. [0004] Therefore, in view of the above technical problems, it is necessary to provide an InGaAs detector chip and a preparation method thereof. Contents of the invention [0005] In view of this, the object of the present invention is to provide an InGaAs detector ch...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/103H01L31/0352H01L31/0304H01L31/18
CPCH01L31/03042H01L31/03046H01L31/035272H01L31/1035H01L31/1844Y02P70/50
Inventor 黄寓洋
Owner SUZHOU SUNA PHOTOELECTRIC
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