A liquid crystal composition containing trifluoromethoxy and its application
A liquid crystal composition, trifluoromethoxy technology, applied in liquid crystal materials, chemical instruments and methods, etc., can solve problems such as ion accumulation and recovery ability
Active Publication Date: 2020-10-27
BEIJING BAYI SPACE LCD MATERIALS TECH
View PDF9 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
However, the afterimage problem of liquid crystal displays has always plagued the field of liquid crystal displays. The afterimage problem is mainly caused by the phenomenon that the previous picture is still retained after the liquid crystal display stays in a static picture for a long time. The main reason is that the ion accumulation and recovery ability are poor.
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment 1
[0401] Table 2: Weight percent and performance parameters of each component in the liquid crystal composition
[0402]
Embodiment 2
[0404] Table 3: Weight percent and performance parameters of each component in the liquid crystal composition
[0405]
[0406]
Embodiment 3
[0408] Table 4: Weight percent and performance parameters of each component in the liquid crystal composition
[0409]
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More
Abstract
The invention relates to a liquid crystal material and application fields thereof, particularly to a trifluoromethoxy-containing liquid crystal composition and applications thereof, wherein the liquidcrystal composition comprises compounds represented by general formulas I, II and III. According to the present invention, the liquid crystal composition has large elastic constant, easily achieves the afterimage recovery of liquid crystal display devices, can improve the afterimage problem of liquid crystal display devices and improve the quality of liquid crystal display devices, can particularly improve the display effects in TN, IPS or FFS mode display devices, and is especially suitable for IPS and FFS mode liquid crystal display devices. The formulas I, II and III are defined in the specification.
Description
technical field [0001] The invention relates to the field of liquid crystal material and its application, in particular to a liquid crystal composition containing trifluoromethoxy and its application. Background technique [0002] At present, LCD product technology has matured, successfully solved technical problems such as viewing angle, resolution, color saturation and brightness, and its display performance has approached or exceeded that of CRT displays. Large-size and small and medium-sized LCDs have gradually occupied the mainstream position of flat panel displays in their respective fields. However, the afterimage problem of liquid crystal displays has always plagued the field of liquid crystal displays. The afterimage problem is mainly caused by the phenomenon that the previous picture is still retained after the liquid crystal display stays in a static picture for a long time. The main reason is that the ion accumulation and recovery ability are poor. . [0003] S...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C09K19/44
Inventor 陈卯先陈海光姜天孟储士红王杰未欣王新颖田会强苏学辉
Owner BEIJING BAYI SPACE LCD MATERIALS TECH
Who we serve
- R&D Engineer
- R&D Manager
- IP Professional
Why Patsnap Eureka
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com