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Method and device for rapidly measuring cross movement platform two-dimensional location errors

A technology of cross movement and two-dimensional positioning, which is applied in the direction of measuring devices, optical devices, instruments, etc., can solve the problems of cumbersome operation, high cost, and long time required, and achieve the effect of simple operation, low cost, and simple structure

Active Publication Date: 2019-05-28
深圳市大族半导体装备科技有限公司
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Problems solved by technology

[0003] The existing method of measuring the two-dimensional error of the cross motion platform is to leave a grid on the surface of flat glass or metal plate by cutting tools, laser processing, etc., and then measure the position of the intersection point of the grid to obtain the two-dimensional error of the cross motion platform at a specific position. Dimensional error, it takes a long time, the operation is more cumbersome, and the cost is higher

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  • Method and device for rapidly measuring cross movement platform two-dimensional location errors
  • Method and device for rapidly measuring cross movement platform two-dimensional location errors
  • Method and device for rapidly measuring cross movement platform two-dimensional location errors

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[0026] In order to facilitate the understanding of the present invention, the present invention will be described more fully below with reference to the associated drawings. Preferred embodiments of the invention are shown in the accompanying drawings. However, the present invention can be embodied in many different forms and is not limited to the embodiments described herein. On the contrary, these embodiments are provided to make the understanding of the disclosure of the present invention more thorough and comprehensive.

[0027] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the technical field of the invention. The terms used herein in the description of the present invention are for the purpose of describing specific embodiments only, and are not intended to limit the present invention.

[0028] refer to figure 1 As shown, a method for quickly measuring the two-dimension...

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Abstract

The invention discloses a method and device for rapidly measuring cross movement platform two-dimensional location errors. The measurement method includes the steps that firstly, a cross movement platform is fixed to a base, a glass plate is fixed to the cross movement platform, and the angle of the glass plate is adjusted, so that the movement direction of grids on the glass plate is the same with that of the cross movement platform; a camera and a lens are also arranged on the base, a light source is arranged on the lens, the luminance of the light source is adjusted, and when the cross movement platform is located at a reference position, initial offsets between the grid intersection point closest to the camera center and the camera center in X and Y directions are recorded; the cross movement platform is moved, all positions needing to be measured are traversed, offsets between the grid intersection point corresponding to each position and the camera center in the X and Y directions are recorded; the initial offsets are subtracted from the obtained offsets of all the positions respectively, and then the two-dimensional location error of each position is obtained. The method anddevice for rapidly measuring the cross movement platform two-dimensional location errors are convenient, easy to operate and low in cost.

Description

technical field [0001] The invention relates to the technical field of industrial automation, and more specifically, to a method and device for quickly measuring two-dimensional positioning errors of a cross motion platform. Background technique [0002] Nowadays, many industrial automation equipment will use the cross motion platform. Due to design, installation and other reasons, the actual position of the cross motion platform after moving will have a two-dimensional error with the command position (that is, the error in the X direction and the error in the Y direction). Since it will affect the processing accuracy of the workpiece placed on the cross motion platform, it is necessary to perform two-dimensional precision compensation on the positioning accuracy of the cross motion platform. Before performing two-dimensional precision compensation, it is first necessary to measure the cross motion platform Two-dimensional errors at some specific locations. [0003] The exi...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/00
Inventor 颜传祥周志伟马国东尹建刚谢文胜胡雄雄朱洪涛洪熔朱晓枫黄政吴林龙陈才伟高云峰
Owner 深圳市大族半导体装备科技有限公司
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