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Pattern projection imaging system

An imaging system and projection technology, applied in the optical field, can solve the problem of large optical total length and so on

Active Publication Date: 2021-09-28
TOPLITE INT CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] Based on this, it is necessary to provide a pattern projection imaging system for the problem of a large total optical length in the traditional pattern projection imaging system

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Embodiment Construction

[0038] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0039] It should be noted that all technical and scientific terms used herein have the same meaning as commonly understood by those skilled in the technical field of the present invention. The terms used herein in the description of the present invention are for the purpose of describing specific embodiments only, and are not intended to limit the present invention. As used herein, the term "and / or" includes any and all combinations of one or more of the associated listed items.

[0040] refer to figure 1 , figure 1 It is a schematic structural diagram of a pattern projection imaging system in a...

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Abstract

The invention relates to a pattern projection imaging system. A curved pattern sheet, a first lens with negative refractive power, a second lens with positive refractive power, and a third lens are sequentially arranged from the object side to the image side. and the second lens to form the first lens group, the third lens is the second lens group, the ratio of the system focal length of the pattern projection imaging system to the focal length of the first lens group is greater than 0.35; the system focal length of the pattern projection imaging system and the second lens group The ratio of the focal length is greater than 0.4. The first lens is a curved lens with a concave surface facing the image side, the second lens is a biconvex lens, and the first lens and the second lens form a cemented lens. The above solution can improve the imaging quality of the pattern projection imaging system, shorten the total optical length of the pattern projection imaging system, and further reduce the manufacturing cost of the pattern projection imaging system by arranging the curved pattern sheet with a certain degree of curvature.

Description

technical field [0001] The invention relates to the field of optics, in particular to a pattern projection imaging system. Background technique [0002] At present, the pattern projection imaging system is widely used in stage equipment, and the clear projection of the pattern is mainly realized through the illumination of the light source. [0003] In the traditional pattern projection imaging system, the pattern sheet is usually coated with optical glass, or the pattern is processed by metal sheet, and the light source is used to illuminate the pattern, so that the pattern can be clearly imaged on the projected surface. [0004] However, due to its own structural limitations, the traditional pattern projection imaging system has large aberrations and chromatic aberrations. When designing the system, it has to be considered to eliminate the aberrations and chromatic aberrations. Therefore, it is necessary to add aspheric lenses and achromatic lenses. The lens is used to el...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B13/00G03B21/14
CPCG02B13/0015G03B21/14
Inventor 尹勇健
Owner TOPLITE INT CO LTD