Detection method of mask plate assembly and splicing accuracy of mask plate assembly
A mask and component technology, which is applied to the photoengraving process of the pattern surface, the originals and instruments for opto-mechanical processing, etc., can solve the problems of low splicing accuracy, dark lines on the display panel, abnormal exposure patterns, etc. Measuring and monitoring effectiveness
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[0041] The features and exemplary embodiments of various aspects of the present invention will be described in detail below. In order to make the objectives, technical solutions and advantages of the present invention more clear, the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only configured to explain the present invention, and are not configured to limit the present invention. It will be apparent to those skilled in the art that the present invention may be practiced without some of these specific details. The following description of the embodiments is only intended to provide a better understanding of the present invention by illustrating examples of the invention.
[0042] It should be noted that, in this document, relational terms such as first and second are used only to distinguish one entity or operation from...
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Abstract
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