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Pixel structure and manufacturing method thereof

A technology of pixel structure and manufacturing method, which is applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve the problems affecting the display quality of the display panel and/or the reliability of electronic components, and achieve the problem of not being easy to undercut Effect

Active Publication Date: 2022-02-18
AU OPTRONICS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, after a lower film layer is patterned by isotropic etching, there will be an obvious undercut problem between the patterned lower film layer and the upper film layer, which will affect the display quality and / or electronic properties of the display panel. component reliability

Method used

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  • Pixel structure and manufacturing method thereof
  • Pixel structure and manufacturing method thereof
  • Pixel structure and manufacturing method thereof

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Embodiment Construction

[0068] The present invention will be described more fully hereinafter with reference to the accompanying drawings, in which exemplary embodiments of the invention are shown. As those skilled in the art would realize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention.

[0069]In the drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. Throughout the specification, the same reference numerals denote the same elements. It will be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "connected to" another element, it can be directly on or connected to the other element, or Intermediate elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. As used herein, "connected" ...

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Abstract

The invention discloses a pixel structure, which includes a substrate, an active element, a first insulating pattern layer, a second insulating pattern layer and a pixel electrode. The active element is disposed on the substrate. The first insulating pattern layer is disposed on the active device and has a first contact window. The second insulating pattern layer is disposed on the first insulating pattern layer and has a second contact window. The pixel electrode is disposed on the second insulating pattern layer, and is electrically connected to the first electrode of the active device through the first contact window and the second contact window. The sidewall and the bottom surface of the first insulating pattern layer at the first contact hole have a first angle α. The sidewall and the bottom surface of the second insulating pattern layer at the second contact hole have a second included angle β. The second included angle β is smaller than the first included angle α. In addition, a method for manufacturing the above-mentioned pixel structure is also proposed.

Description

technical field [0001] The invention relates to a pixel structure and a manufacturing method thereof. Background technique [0002] Etching technology is often used in display panels and semiconductor-related industries, and can be mainly divided into wet etching (Wet Etching) and dry etching (Dry Etching). Generally speaking, wet etching is isotropic etching, while dry etching is anisotropic etching. The process time of isotropic etching is shorter than that of anisotropic etching. However, after a lower film layer is patterned by isotropic etching, there will be an obvious undercut problem between the patterned lower film layer and the upper film layer, which will affect the display quality and / or electronic properties of the display panel. component reliability. Therefore, there is an urgent need for a technical solution that can solve the above problems. Contents of the invention [0003] The invention provides a pixel structure with good performance. [0004] The...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L27/12H01L27/32H01L21/82
CPCH01L27/1214H01L27/1259H01L21/77H10K59/121H10K59/12
Inventor 杨智钧曾文贤白佳蕙吴炘儒胡又元陈韦潔李冠谊吴冠贤陈奕达
Owner AU OPTRONICS CORP
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