Actuator, linear motor and lithographic apparatus
A technology for linear motors and lithography equipment, used in opto-mechanical equipment, instruments, optics, etc., to solve problems such as large tolerances in thermal resistance of coils and cooling plates, failures, thickness fluctuations, etc.
Active Publication Date: 2019-12-31
ASML NETHERLANDS BV
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- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Tolerances in the distance between the coil and the cooling plate lead to thickness fluctuations of intermediate structures such as potting materials and thus to relatively large tolerances in the thermal resistance between the coil and the cooling plate
[0007] Assuming a certain current is applied to the coil, the resulting difference in heat transfer between the coil and the cooling plate may result in a tolerance band of the coil temperature
This effect is even worse when the heat generated also causes the coil resistance to increase, which can lead to failure when overheated
Method used
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Embodiment Construction
[0022] figure 1 A lithographic apparatus according to an embodiment of the present invention is schematically shown. The apparatus comprises an illumination system IL, a support structure MT, a substrate table WT and a projection system PS.
[0023] The illumination system IL is configured to condition the radiation beam B. The support structure MT (eg mask table) is configured to support the patterning device MA (eg mask) and is connected to a first positioner PM configured to accurately position the patterning device according to certain parameters. The substrate table WT (e.g., a wafer table) is configured to hold a substrate W (e.g., a resist-coated wafer) and is connected to a second positioner configured to accurately position the substrate according to certain parameters PW. The projection system PS is configured to project the pattern imparted to the radiation beam B by the patterning device MA onto a target portion C of the substrate W (eg comprising one or more di...
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An actuator comprises a coil, a first cooling plate and a second cooling plate. The cooling plates are configured to cool the coil. The first and second cooling plates are arranged at opposite sides of the coil to be in thermal contact with the coil. The coil comprises a first coil part and a second coil part, the first coil part facing the first cooling plate and the second coil part facing the second cooling plate, the first and second coil parts being separated by a spacing there between. The first cooling plate, the first coil part, the spacing, the second coil part and the second coolingplate form a stacked structure whereby the coil parts are arranged between the cooling plates and the spacing is arranged between the coil parts. The actuator further comprises a filling element arranged in the spacing. The filling element to push the first coil part towards the first cooling plate and to push the second coil part towards the second cooling plate.
Description
[0001] Cross References to Related Applications [0002] This application claims priority from European application 17173011.2 filed on May 26, 2017, the entire content of which is hereby incorporated by reference. technical field [0003] The invention relates to an actuator, a linear motor comprising such an actuator and a lithographic apparatus comprising such an actuator. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg comprising part of a die, one or several dies) on a substrate (eg a silicon wafer). Typically, transfer of the pattern ...
Claims
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IPC IPC(8): H02K41/00H02K9/22
CPCH02K41/02H02K9/223H02K3/345G03F7/70758H02K3/24H02K9/22H02K9/227G03F7/70775H02K7/12H02K41/031
Inventor N·C·P·J·海尔茨F·斯坦德霍德尔斯E·G·B·霍夫斯泰
Owner ASML NETHERLANDS BV