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Plasma reaction chamber structure with adjustable radio frequency coil

A plasma and reaction chamber technology, applied in circuits, discharge tubes, electrical components, etc., can solve the problems of inability to form a circular RF coil shape, affecting plasma distribution and stability, and easy deformation of RF coils.

Active Publication Date: 2022-07-12
HERMES EPITEK
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  • Summary
  • Abstract
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AI Technical Summary

Problems solved by technology

[0004] The present invention is a plasma reaction chamber structure with adjustable radio frequency coil, which mainly solves the problem that the radio frequency coil is only fixed in a single format, because it is a fixed design without an adjustment mechanism, and the top of the radio frequency coil is easily deformed, resulting in failure to form The shape of the circular RF coil affects issues such as plasma distribution and stability

Method used

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  • Plasma reaction chamber structure with adjustable radio frequency coil
  • Plasma reaction chamber structure with adjustable radio frequency coil
  • Plasma reaction chamber structure with adjustable radio frequency coil

Examples

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Embodiment Construction

[0065] like 2A to 2E As shown, the first embodiment is a plasma reaction chamber structure 100 with an adjustable radio frequency coil, which includes: an upper support 10; a plurality of clamping bolts 20; a lower support 30; a plurality of continuous sliding clamping 40; and the radio frequency coil 50.

[0066] The upper support 10 is a structural support member of the plasma reaction chamber structure.

[0067] like Figure 2C As shown, a plurality of clamping bolts 20 are combined with the upper support 10 to adjust the lifting height, and in order to adjust the radio frequency coil 50 more accurately, elastically, conveniently and effectively, each clamping bolt 20 is a The upper clamping part 210 can be continuously slidable.

[0068] The continuity referred to in this embodiment means that it is not limited by the distance of the first order and the first order, and can be a movement of any distance, for example: 0.5 cm, 0.01 cm, 0.003 cm, 0.N cm, etc. There is no ...

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Abstract

The invention provides a plasma reaction chamber structure with an adjustable radio frequency coil, which comprises: an upper support; a plurality of clamping bolts, which can be continuously slid in conjunction with the upper clamping part; a lower support; and a plurality of continuous sliding parts The clamping piece has a lower clamping part and an elongated perforation; and a radio frequency coil, which is clamped between the upper clamping part and the lower clamping part and forms a surrounding structure. With the implementation of the present invention, the adjustment of the radio frequency coil can be quickly completed and the goal of uniform distribution of the plasma field in the cavity can be achieved.

Description

technical field [0001] The present invention is a plasma reaction cavity structure with adjustable radio frequency coil, in particular to a plasma reaction cavity structure with adjustable radio frequency coil using an etching machine. Background technique [0002] Plasma has been widely used in various fields. For example, in the manufacture of semiconductor integrated circuits, the growth of thin films of different materials and the etching of circuits are generally achieved by plasma technology. In plasma technology, the plasma source is the key to the system. Current methods for generating plasma include DC discharge, low frequency and medium frequency discharge (several KHz to several MHz), radio frequency discharge (13.6MHz), and microwave discharge (2.45GHz) in terms of power sources used. [0003] like Figure 1A and Figure 1B As shown, in terms of semiconductor manufacturing process, RF discharge is used the most, so RF coils are often used to achieve RF discharg...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/32
CPCH01J37/32082H01J37/32431H01J37/32798H01J2237/3174
Inventor 陈俊龙徐光俊
Owner HERMES EPITEK
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