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Control system for lithography equipment

A control system and actuation system technology, applied in microlithography exposure equipment, optomechanical equipment, X-ray equipment, etc.

Active Publication Date: 2022-06-28
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Optical aberrations can change the shape of the wavefront of a laser radiation beam in an undesired way

Method used

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  • Control system for lithography equipment
  • Control system for lithography equipment
  • Control system for lithography equipment

Examples

Experimental program
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Embodiment Construction

[0037] figure 1A lithography system is shown that includes a control system 20 for adjusting the shape of the wavefront of a radiation beam according to one embodiment of the present invention. The lithography system includes a radiation source SO and a lithography apparatus LA. The radiation source SO is configured to generate a beam B of extreme ultraviolet (EUV) radiation. The lithographic apparatus LA includes an illumination system IL, a support structure MT configured to support a patterning device MA (eg, a mask), a projection system PS, and a substrate table WT configured to support a substrate W. The illumination system IL is configured to condition the radiation beam B before it is incident on the patterning device MA. Projection system PS is configured to project radiation beam B (now patterned through mask MA) onto substrate W. The substrate W may include previously formed patterns. In this case, the lithographic apparatus aligns the patterned radiation beam B ...

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Abstract

A control system is configured to adjust the wavefront of the beam or radiation. The control system has a pair of mirrors defining a portion of the propagation path of the beam. Each of the mirrors has a contoured reflective surface configured to cause a change in the wavefront of the beam. The mirrors are positioned in such a way that rotation of the mirrors relative to each other enables adjustment of the wavefront without affecting the propagation path.

Description

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS [0002] This application claims priority to European application 17192125.7 filed on September 20, 2017, the entire content of which is incorporated herein by reference. technical field [0003] The present invention relates to a control system for adjusting the wavefront of a radiation beam. The control system may form part of a radiation source suitable for a lithographic apparatus. Background technique [0004] A lithographic apparatus is a machine configured to apply a desired pattern to a substrate. Lithographic apparatuses may be used, for example, in the manufacture of integrated circuits (ICs). A lithographic apparatus may, for example, project a pattern from a patterning device (eg, a mask) onto a layer of radiation-sensitive material (resist) disposed on a substrate. [0005] The wavelength of radiation used by a lithographic apparatus to project a pattern onto a substrate determines the minimum size of features th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/08G03F7/20G02B26/08
CPCG02B5/0891G02B26/08G03F7/70033H05G2/008
Inventor F·C·D·德纳维尔A·S·特奇科夫
Owner ASML NETHERLANDS BV