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Crystalline silicon cell capable of preventing edge electric leakage, and preparation method thereof

A crystalline silicon cell, edge leakage technology, applied in circuits, photovoltaic power generation, electrical components and other directions, can solve the problems of large edge leakage current, affect yield and reliability, leakage and other problems, achieve large aluminum back field area, improve battery Conversion efficiency, the effect of eliminating edge leakage

Pending Publication Date: 2021-01-08
SHANXI LUAN PHOTOVOLTAICS TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] In the screen printing process for the manufacture of crystalline silicon solar cells, since the electronic paste will inevitably contaminate the table paper, screen, table, track and fixture, it will more or less occur during the printing and transmission of silicon wafers. Contaminated by electronic paste, the surface leakage current along the edge of the battery will be generated, which will affect the conversion efficiency, and seriously cause hot spots and leakage, which will affect the yield and reliability
In order to reduce edge leakage, usually the aluminum back field is 0.5mm-1mm away from the edge of the silicon wafer. If it is less than 0.5mm, once the printing is offset or the edge is stained during the printing process, the edge leakage current will be too large, causing the battery chip short circuit

Method used

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Embodiment Construction

[0015] In order to make the object, technical solution and advantages of the present invention more clear, the present invention will be further described in detail below in conjunction with the examples. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0016] The invention relates to a crystalline silicon battery which prevents edge leakage. There is a layer of 25-40μm high-temperature insulating film on the periphery of each battery sheet of the crystalline silicon battery. The high-temperature insulating film is stable at 1000 degrees Celsius. The anti-edge leakage crystalline silicon cell can be regarded as composed of a positive electrode layer, a silicon substrate layer, and an aluminum back electrode layer from top to bottom, and a layer of 25-40 μm high-temperature insulating film is wrapped around the silicon substrate layer, which is high-temperature insulation T...

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Abstract

The invention relates to the field of solar cell production. A crystalline silicon cell capable of preventing edge electric leakage is characterized in that a layer of 25-40 [mu]m high-temperature insulating film is arranged on the peripheral side of each cell piece of the crystalline silicon cell, and the high-temperature insulating film has stability at 1000 DEG C. A preparation method of the crystalline silicon cell capable of preventing edge electric leakage comprises the following steps: preparing the layer of 25-40 [mu]m high-temperature insulating film on the peripheral side of a silicon wafer before preparing positive and negative electrodes of a cell piece, and then preparing the positive and negative electrodes. According to the cell piece of the crystalline silicon cell designedby the invention, edge electric leakage caused by metal slurry in a silk-screen printing process is avoided by utilizing the high-temperature-resistant insulating film formed at the periphery, and meanwhile, the conversion efficiency of the battery is improved due to a larger aluminum back surface field area.

Description

technical field [0001] The invention relates to the field of solar cell production. Background technique [0002] In the screen printing process for the manufacture of crystalline silicon solar cells, since the electronic paste will inevitably contaminate the table paper, screen, table, track and fixture, it will more or less occur during the printing and transmission of silicon wafers. Contaminated by electronic paste, surface leakage current along the edge of the battery will be generated, which will affect the conversion efficiency, and seriously cause hot spots and leakage, which will affect the yield and reliability. In order to reduce edge leakage, usually the aluminum back field is 0.5mm-1mm away from the edge of the silicon wafer. If it is less than 0.5mm, once the printing is offset or the edge is stained during the printing process, the edge leakage current will be too large, causing the battery chip short circuit. Contents of the invention [0003] The technic...

Claims

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Application Information

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IPC IPC(8): H01L31/0216H01L31/068H01L31/18
CPCH01L31/02167H01L31/068H01L31/1804Y02E10/547Y02P70/50
Inventor 姚猛王海超王琦
Owner SHANXI LUAN PHOTOVOLTAICS TECH