EUV light source tin target droplet generating device
A technology of generating device and tin target, applied in the field of EUV light source tin target droplet generation device, can solve the problems of inconvenient constant temperature control, affecting the effect of droplet generation, uneven temperature of cavity, etc., and achieve stable temperature control effect of tin material , Reduce the risk of contaminating tin materials, and facilitate the effect of feedback control
Inactive Publication Date: 2021-01-26
ZHEJIANG UNIV
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Problems solved by technology
[0003] In order to ensure that the tin in the tin storage cavity of the tin target droplet generator is in a liquid state, the temperature in the cavity must be maintained at 250°C. For this reason, a heater is required. The most common heating method is electric heating. Installing a heating tube inside for heating, this method is simple and direct, and the easiest to implement, but has the following disadvantages: the heating tube can only be immersed in liquid tin in advance for heating, so additional tin pre-melting and conveying equipment is required; the heating tube and tin Direct contact with the liquid, there is a risk of reaction at high temperature, which will affect the effect of the droplet generation; essentially heated by the heating wire, the energy consumption is high, and it is easy to cause uneven temperature in the cavity; the heating response is slow, the heating speed is slow, and the constant temperature control inconvenient
It is generally believed that metals reflect microwaves, and microwaves cannot heat metals; however, in recent years, it has been found that microwaves can also be used in the field of heating and melting metals and corresponding devices have been developed. For example, the invention patent with application number 201621357457.9 discloses a microwave tin melting device , using microwaves to melt the solid tin material and then purify and form it, but the discharge structure of the device is simple, so it is not suitable for the tin target droplet generating device
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[0017] The following describes specific embodiments of the present invention in conjunction with the accompanying drawings.
[0018] Such as figure 1 As shown, an EUV light source tin target droplet generating device has a ring shape as a whole. The box body 2, the cover plate 12 and the bottom plate 13 are connected to each other to form a hollow cavity inside. The material of the box body 2, the cover plate 12 and the bottom plate 13 can be stainless steel. A molten pool 7 is set inside the cavity, and the interior of the molten pool 7 contains tin material 4, which can be liquid tin or solid tin; tin material can be replenished manually from the cover plate 12, or can be set to automatically feed device. A microwave source is provided inside the cavity and outside the molten pool 7. The microwave source includes a magnetron 3 and a waveguide 10. The magnetron 3 generates microwaves and enters the resonant cavity 9 through the waveguide 10; multiple magnetrons 3 and wavegu...
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Abstract
The invention relates to an EUV light source tin target droplet generating device. A molten pool is contained in a cavity, and tin materials are contained in the molten pool; pressure gas is suppliedinto the molten pool, so that the pressure in the cavity is kept positive to the external environment; a spray hole is formed in the bottom of the cavity, and the diameter of the spray hole ranges from 1 micrometer to 1000 micrometers; the microwave source is arranged inside the cavity and outside the molten pool; a vibration excitation element is arranged in the molten pool and is used for applying vibration disturbance to the tin material near the spray hole; and an infrared temperature sensor is arranged in the molten pool to monitor the temperature of the solder. The device has the advantages that the heating speed is high, the heating is uniform, and the energy consumption is low; a tin material pre-melting and conveying device does not need to be additionally arranged, and meanwhile,the risk of tin material pollution is reduced; the possible ignition risk of sensors such as a thermocouple in a microwave environment is avoided; and the sparking phenomenon caused by microwaves acting on tin materials is avoided.
Description
technical field [0001] The invention belongs to the technical field of generating tin target droplets of a photolithography machine light source, and in particular relates to a device for generating tin target droplets of an EUV light source. Background technique [0002] EUV lithography machine is a semiconductor manufacturing equipment that uses extreme ultraviolet light (EUV) with a wavelength of 13.5nm to expose photoresist. The principle of generating extreme ultraviolet light is to use carbon dioxide laser to bombard tin with a diameter of tens of microns. The liquid droplet (tin target) vaporizes it and forms a plasma, which releases photons, which are collected to obtain extreme ultraviolet light. The principle of the existing tin target droplet generating device is to melt the tin material, pressurize the liquid tin to eject from the pressure chamber to form a jet, apply disturbance to the tin jet, and use the Rayleigh instability phenomenon to make it break and for...
Claims
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IPC IPC(8): H05B6/80G03F7/20
CPCG03F7/70033H05B6/80
Inventor胡亮宋光敏方言燊付新
OwnerZHEJIANG UNIV